IEC 62047-17:2015
(Main)Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films
Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films
IEC 62047-17:2015 specifies the method for performing bulge tests on the free-standing film that is bulged within a window. The specimen is fabricated with micro/nano structural film materials, including metal, ceramic and polymer films, for MEMS, micromachines and others. The thickness of the film is in the range of 0,1 μ to 10 μ, and the width of the rectangular and square membrane window and the diameter of the circular membrane range from 0,5 mm to 4 mm. The tests are carried out at ambient temperature, by applying a uniformly-distributed pressure to the testing film specimen with bulging window. Elastic modulus and residual stress for the film materials can be determined with this method.
Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 17: Méthode d'essai de renflement pour la mesure des propriétés mécaniques des couches minces
L'IEC 62047-17:2015 spécifie la méthode permettant d'effectuer des essais de renflement sur une couche autonome bombée dans une fenêtre. Le spécimen est fabriqué avec des matériaux de couche de structure micrométrique ou nanométrique, y compris les couches en métal, céramique et polymère, pour des MEMS, des micromachines et autres. L'épaisseur du film est comprise entre 0,1 μ et 10 μ et la largeur de la fenêtre à membrane rectangulaire et carrée ainsi que le diamètre de la membrane circulaire sont compris entre 0,5 mm et 4 mm. Les essais sont effectués à température ambiante par l'application d'une pression uniformément répartie sur le spécimen de couche d'essai avec fenêtre bombée. Le module d'élasticité et la contrainte résiduelle des matériaux de la couche peuvent être déterminés avec cette méthode.
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Standards Content (Sample)
IEC 62047-17 ®
Edition 1.0 2015-03
INTERNATIONAL
STANDARD
NORME
INTERNATIONALE
colour
inside
Semiconductor devices – Micro-electromechanical devices –
Part 17: Bulge test method for measuring mechanical properties of thin films
Dispositifs à semiconducteurs – Dispositifs microélectromécaniques –
Partie 17: Méthode d'essai de renflement pour la mesure des propriétés
mécaniques des couches minces
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IEC 62047-17 ®
Edition 1.0 2015-03
INTERNATIONAL
STANDARD
NORME
INTERNATIONALE
colour
inside
Semiconductor devices – Micro-electromechanical devices –
Part 17: Bulge test method for measuring mechanical properties of thin films
Dispositifs à semiconducteurs – Dispositifs microélectromécaniques –
Partie 17: Méthode d'essai de renflement pour la mesure des propriétés
mécaniques des couches minces
INTERNATIONAL
ELECTROTECHNICAL
COMMISSION
COMMISSION
ELECTROTECHNIQUE
INTERNATIONALE
ICS 31.080.99 ISBN 978-2-8322-2295-9
– 2 – IEC 62047-17:2015 © IEC 2015
CONTENTS
FOREWORD . 4
1 Scope . 6
2 Normative references . 6
3 Terms, definitions and symbols. 6
3.1 Terms and definitions . 6
3.2 Symbols . 7
4 Principle of bulge test . 7
5 Test apparatus and environment . 8
5.1 General . 8
5.2 Apparatus . 9
5.2.1 Pressuring device . 9
5.2.2 Bulge (pressure) chamber. 9
5.2.3 Height measurement units . 9
5.3 Test environment . 10
6 Specimen . 10
6.1 General . 10
6.2 Shape and dimension of specimen . 10
6.3 Measurement of test piece dimension . 10
7 Test procedure and analysis . 11
7.1 Test procedure . 11
7.2 Data analysis . 12
8 Test report . 13
Annex A (informative) Determination of mechanical properties . 14
A.1 General . 14
A.2 Determination of mechanical properties using stress-strain curve . 14
A.3 Determination of mechanical properties using analysis of load-deflection . 16
Annex B (informative) Deformation measurement techniques . 19
B.1 General . 19
B.2 Laser interferometry technique . 19
B.3 Capacitance type measurement . 19
Annex C (informative) Example of test piece fabrication: MEMS process . 25
C.1 Test piece fabrication . 25
C.2 Measurement of shape of specimen . 26
Bibliography . 27
Figure 1 – Typical example of bulge specimen . 7
Figure 2 – Membrane window bulged by pressure . 8
Figure 3 – Typical example of bulge test apparatus . 8
Figure 4 – Bulge membrane window shapes . 10
Figure 5 – Example of typical pressure-height curve obtained from bulge test . 12
Figure A.1 – Determination of biaxial modulus in the stress-strain curve obtained from
bulge test . 18
Figure B.1 – Typical example of laser interferometer configuration . 21
Figure B.2 – Typical fringe patterns obtained from laser Michelson interferometry and
ESPI system . 22
Figure B.3 – Typical example of the measurement system using a photo detector . 23
Figure B.4 – Schematic of capacitance bulge tester . 23
Figure B.5 – Typical example of relationship between bulge height and capacitance
change . 24
Figure C.1 – Example of fabrication procedure for bulge test piece . 25
Table 1 – Symbols and designations of a specimen . 7
Table A.1 – Examples of various expressions of parameters, C and C (ν), for thin
1 2
square films . 17
Table A.2 – Examples of various expressions of parameters, C and C (ν), for thin
1 2
spherical films . 17
– 4 – IEC 62047-17:2015 © IEC 2015
INTERNATIONAL ELECTROTECHNICAL COMMISSION
____________
SEMICONDUCTOR DEVICES –
MICRO-ELECTROMECHANICAL DEVICES –
Part 17: Bulge test method for measuring
mechanical properties of thin films
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