ASTM E3001-20

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Designation: E3001 − 15 E3001 − 20
Standard Practice for
Workforce Education in Nanotechnology Characterization
This standard is issued under the fixed designation E3001; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope
1.1 This practice describes a procedure to provide the basic education of characterization methods for nanometer-scale materials,
to be taught at an undergraduate college level. This education should be broad and include a suite of characterization methods to
prepare an individual to work in various capacities within one of the many areas in nanotechnology research, development, or
manufacturing.
1.2 This practice may be used to develop or evaluate an education program for characterization in the nanotechnology field. It
provides listings of key methods that are relevant to such a program, with a minimum number of these methods to be taught as
a requirement for such an education. This practice does not provide specific course material to be used in such a program.
1.3 While no units of measurements are used in this practice, values stated in SI units are to be regarded as standard.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory
limitations prior to use.
1.4 This standard does not purport to address all of the characterization methods for nanometer-scale materials, nor is it meant
for use in certification processes. It is the responsibility of the user of this standard to utilize other knowledge and skill objectives
as applicable to local conditions or required by local regulations.
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of
regulatory limitations prior to use.
1.6 This international standard was developed in accordance with internationally recognized principles on standardization
established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued
by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents
2.1 ASTM Standards:
E2456 Terminology Relating to Nanotechnology
E2996 Guide for Workforce Education in Nanotechnology Health and Safety
E3089 Guide for Nanotechnology Workforce Education in Material Properties and Effects of Size
This practice is under the jurisdiction of ASTM Committee E56 on Nanotechnology and is the direct responsibility of Subcommittee E56.07 on Education and Workforce
Development.
Current edition approved Jan. 1, 2015Sept. 1, 2020. Published March 2015October 2020. Originally approved in 2015. Last previous edition approved in 2015 as E3001
– 15. DOI: 10.1520/E3001-15.10.1520/E3001-20.
For referenced ASTM standards, visit the ASTM website, www.astm.org, or contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
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2.2 OtherISO Standards:
BSI PAS 133 Terminology for Nanoscale Measurement and Instrumentation
ISO/TS 2768780004-1 Nanotechnologies – Terminology and Definitions for Nano-Objects – Nanoparticle, Nanofibre, and
NanoplateVocabulary – Part 1: Core terms
ISO/TS 80004-6 Nanotechnologies – Vocabulary – Part 6: Nano-Object CharacterizationNano-object characterization
3. Terminology
3.1 Definitions:
3.1.1 For definitions of terms related to nanotechnology in general, refer to Terminology E2456 and ISO/TS 27687.80004-1.
3.1.2 For definitions of terms related to measurement methods and instrumentation used, refer to BSI PAS 133 and ISO/TS
80004-6.
3.2 Definitions of Terms Specific to This Standard:
3.2.1 characterization, n—measurement(s), using one or more methods, to determine the structure and composition of a material
as well as its physical or chemical properties.
3.2.2 education, n—the teaching of specific topics as part of a degree or certificate program, or as training to provide additional
skills and knowledge.
4. Summary of Practice
4.1 This practice designates a list of nineteen characterization methods to be relevant to nanotechnology workforce education.
Methods are grouped into two tiers, with five methods classified as Tier 1 and the others as Tier 2. Method selection and tier
classification are based on inputs from industry, nanotechnology educators, and subject matter experts.
4.2 For each characterization method in the list, important topics to be covered are listed specifically.
4.3 From this list, five methods have been classified as Tier 1. An educational program is to select at least three Tier 1 methods
to be taught in detail, and to teach the remaining two Tier 1 methods plus a minimum of five Tier 2 methods at an introductory
level.
NOTE 1—Tier 1 methods are considered key. This requirement ensures that all Tier1 methods are taught, even when there are practical time constraints
on the quantity of instructional material that can be covered in an undergraduate-level program.
4.4 This approach provides both a broad education as well as in-depth emphasis for key subjects within the time constraints of
an instructional course or program.
5. Significance and Use
5.1 This practice establishes the basic structure for education in the characterization of nanoscale materials at the undergraduate
college level. The approach taken is to classify specific characterization methods into two tiers, with a minimum number of
methods to be selected from each tier and taught at an in-depth or introductory level. This offers the flexibility of tailoring to
regional industry needs while still retaining a high degree of equivalency in educational depth and breadth across geographical
boundaries.
5.2 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a
complement of characterization methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology
field.
5.3 This practice is intended to be one in a series of standards developed for workforce education in various aspects of
Available from British Standards Institution (BSI), 389 Chiswick High Rd., London W4 4AL, U.K., http://www.bsigroup.com.
Available from International Organization for Standardization (ISO), 1, ch. de la Voie-Creuse, CP 56, CH-1211 Geneva 20,ISO Central Secretariat, BIBC II, Chemin de
Blandonnet 8, CP 401, 1214 Vernier, Geneva, Switzerland, http://www.iso.org.
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nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in
nanotechnology, thus providing dynamic and evolving workforce education.
6. General Background Knowledge and Skills
6.1 Introductory algebra, chemistry, physics, and statistics at the college level.
6.2 The environmental, health and safety (EHS) hazards presented by nanoscale materials can be very different from those
presented by bulk materials. Students should have a basic understanding of the unique EHS factors when handling nanoscale
materials.
NOTE 2—See Guide E2996 for details.
6.3 Students should also have a basic knowledge of the unique physical and chemical properties of nanoscale materials as
compared to their bulk equivalents.
NOTE 3—See Guide E3089 for details.
7. Concepts and Skills to be Covered
7.1 Characterization methods covered should include ones based on electron beam, scanning probe, optical, ion beam, and X-ray
techniques, as well as electrical, mechanical and thermal measurements. Method selection is based on inputs from industry,
nanotechnology educators and subject matter experts.
7.2 Usage of the appropriate methods for a given type and quantity of material or sample will also be covered, together with
sample preparation and data analysis methodology.
7.3 The methods relevant for workforce education in nanotechnology characterization are given in Section 8, with important topics
to be covered for each method listed specifically. Additional methods or topics, or both, may be added on an as-needed basis.
8. Characterization Methods Relevant to Nanotechnology Workforce Education
8.1 Scanning Electron Microscopyelectron microscopy (SEM) or Field Emissionfield emission (FE) SEM, or Both:both:
8.1.1 Vacuum system operation,operation.
8.1.2 Appropriate materials to be analyzed,analyzed.
8.1.3 Magnification range,range.
8.1.4 Sample preparation,preparation.
8.1.5 Care of biological samples,samples.
8.1.6 Types of emission,emission.
8.1.7 Impact of beam energy and spot size,size.
8.1.8 Detection of secondary electrons,electrons.
8.1.9 Detection of backscattered electrons, andelectrons.
8.1.10 Corrections for astigmatism and aberration.
8.2 Transmission Electron Microscopyelectron microscopy (TEM):
8.2.1 Vacuum system operation,operation.
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8.2.2 Appropriate materials to be analyzed,analyzed.
8.2.3 Magnification range,range.
8.2.4 Sample preparation and sample thinning methods,methods.
8.2.5 Care of biological samples,samples.
8.2.6 Bright field mode,mode.
8.2.7 Diffraction contrast,contrast.
8.2.8 Impact of beam energy, andenergy.
8.2.9 Corrections for astigmatism and aberration.
8.3 Energy Dispersive X-Ray Spectroscopydispersive X-ray spectroscopy (EDS):
8.3.1 Vacuum system operation,operation.
8.3.2 Appropriate materials to be analyzed,analyzed.
8.3.3 Electron beam source,source.
8.3.4 X-ray detector,detector.
8.3.5 Spectrum and data analysis,analysis., and
8.3.6 Detection limit.
8.4 Scanning Probe Microscopyprobe microscopy (SPM):
8.4.1 Atomic Force Microscopyforce microscopy (AFM):
8.4.1.1 AFM tip technology and tip construction,construction.
8.4.1.2 Vibration isolation needs and solutions,solutions.
8.4.1.3 Optical lever,lever.
8.4.1.4 Photodiode detector,detector.
8.4.1.5 Probe positioning mechanism,mechanism.
8.4.1.6 Cantilever spring constant and resonance frequency,frequency.
8.4.1.7 Sample preparation and mounting,mounting.
8.4.1.8 Laser alignment on cantilever, andcantilever.
8.4.1.9 Modes of operation: contact, tapping, and non-contact.
8.4.2 Scanning Tunneling Microscopytunneling microscopy (STM):
8.4.2.1 Tip and sample conductivity,conductivity.
8.4.2.2 Vibration isolation needs and solutions,solutions.
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8.4.2.3 Sample flatness,flatness.
8.4.2.4 Probe positioning mechanism,mechanism.
8.4.2.5 Probe tip construction,construction.
8.4.2.6 Piezoelectric tube scanner,scanner.
8.4.2.7 Feedback loop proportional-integral-derivative (PID) control,control.
8.4.2.8 Cases needing ultra high vacuum measurements, andmeasurements.
8.4.2.9 Range of operation.
8.5 Profilometry:Stylus profilometry:
8.5.1 Appropriate materials to be analyzed,analyzed.
8.5.2 Range of operation,operation.
8.5.3 Calibration, andCalibration.
8.5.4 Stylus designs and stylus force.
8.6 Raman Spectroscopy:spectroscopy:
8.6.1 Concept of operation,operation.
8.6.2 Appropriate materials to be analyzed, andanalyzed.
8.6.3 Chemical bonds and Doppler interactions.
8.7 Fourier Transform Infrared Spectroscopytransform infrared spectroscopy (FTIR):
8.7.1 Appropriate materials to be analyzed,analyzed.
8.7.2 Sample preparation,preparation.
8.7.3 Infrared emitter,emitter.
8.7.4 Michelson interferometer operation,operation.
8.7.5 Overview of the theory of Fourier transforms, andtransforms.
8.7.6 Interferogram analysis.
8.8 Spectrophotometry:
8.8.1 Appropriate materials to be analyzed,analyzed.
8.8.2 Transmittance and reflectance mode, andmode.
8.8.3 Sample preparation and cuvettes.
8.9 Optical Microscopy:microscopy:
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8.9.1 Light Microscopy:microscopy:
8.9.1.1 Appropriate materials to be analyzed,analyzed.
8.9.1.2 Magnification range and resolution limits, andlimits.
8.9.1.3 Brightfield and darkfield illumination.
8.9.2 Fluorescence Microscopy:microscopy:
8.9.2.1 Light sources,sources.
8.9.2.2 Application to biological samples, andsamples.
8.9.2.3 Limitations.
8.9.3 Scanning Confocal Microscopy:confocal microscopy:
8.9.3.1 Scanning modes: laser scanning and spinning disc, anddisc.
8.9.3.2 3-dimensional image reconstruction and multi-channel image overlay.
8.10 Ellipsometry:
8.10.1 Appropriate materials to be analyzed,analyzed.
8.10.2 One-angle verses two-angle measurements, andmeasurements.
8.10.3 Stoichiometric information.
8.11 Contact Angle Measurement:angle measurement:
8.11.1 Appropriate materials to be analyzed,analyzed.
8.11.2 Surface energy, andenergy.
8.11.3 Relationship of surface energy for water and protein adhesion and implications for biocompatibility.
8.12 Auger Electron Spectroscopyelectron spectroscopy (AES):
8.12.1 Vacuum system operation,operation.
8.12.2 Electron transitions and the Auger Effect,effect.
8.12.3 Spectrum and data analysis,analysis.
8.12.4 Instrumentation,Instrumentation.
8.12.5 Quantitative analysis, andanalysis.
8.12.6 Depth profile.
8.13 Secondary-Ion Mass SpectroscopySecondary-ion mass spectroscopy (SIMS):
8.13.1 Vacuum system operation,operation.
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8.13.2 Appropriate materials to be analyzed,analyzed.
8.13.3 Element sensitivity range,range.
8.13.4 Ion source:
8.13.4.1 Ion beam selection and interaction with surface,surface.
8.13.4.2 Gaseous ionization by electron ionization,ionization.
8.13.4.3 Surface ionization of Cs ions, andions.
8.13.4.4 Liquid metal ionization.
8.13.5 Static versus dynamic measurement methods:
8.13.5.1 Sputter rates.
8.13.6 Types of emission,emission.
8.13.7 Impact of beam energy, andenergy.
8.13.8 Sample charging and reduction o
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