ISO/TS 21383:2021

TECHNICAL ISO/TS
SPECIFICATION 21383
First edition
2021-03
Microbeam analysis — Scanning
electron microscopy — Qualification
of the scanning electron microscope
for quantitative measurements
Reference number
©
ISO 2021
© ISO 2021
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ii © ISO 2021 – All rights reserved

Contents Page
Foreword .v
Introduction .vi
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Symbols and abbreviated terms . 3
5 General principles . 5
5.1 Condition setting . 5
5.2 Contrast/brightness setting . 5
5.3 Sample preparation . 6
6 Measurement of image sharpness . 7
7 Measurement of drift and drift-related distortions (imaging repeatability) .8
7.1 Measurement of image drifts within specified time intervals. . 9
7.1.1 One-minute drift measurement .10
7.1.2 Ten-minute drift measurement .10
7.1.3 One-hour drift measurement .10
7.1.4 Long-term larger than one-hour drift measurement .10
7.2 Evaluation of the drift and the drift-related distortions by using image overlay .11
7.3 Evaluation of the drift and the drift-related distortions by using cross-correlation
function (CCF) .13
7.3.1 Measurement of the drifts by using the CCF .13
7.3.2 Measurement of the distortions by using the CCF .15
8 Measurement of electron-beam-induced contamination .15
8.1 Cleaning of the sample surface .16
8.2 Cleaning of the inner surfaces of the sample chamber .16
8.3 Measurement method of the contamination.17
8.3.1 Measurement of the height of the contamination growth .17
8.3.2 Measurement of relative carbon concentration of the contamination by
the X-ray analysis .18
8.3.3 Measurement of the surface contamination by the change of SEM signal
intensities .18
9 Measurement of the image magnification and linearity .19
9.1 Measurement of the image magnification .20
9.2 Measurement of the image linearity .21
10 Measurement of background noise .22
10.1 Evaluation methods by using noise profiles and processed images .22
10.2 Evaluation methods by calculating numerical image properties .28
11 Measurement of the primary electron beam current .30
11.1 Ten-minute primary electron beam current measurement .30
11.2 Long-term primary electron beam current measurement .30
12 Reporting Form .32
Annex A (informative) Measurement of image sharpness .34
Annex B (informative) Measurement of image drift and distortions caused by unintended
motions .36
Annex C (informative) Measurement of electron beam-induced contamination .47
Annex D (informative) Measurement of the image magnification and linearity .53
Annex E (informative) Measurement of the primary electron beam current .56
Bibliography .58
iv © ISO 2021 – All rights reserved

Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
bodies (ISO member bodies). The work of preparing International Standards is normally carried out
through ISO technical committees. Each member body interested in a subject for which a technical
committee has been established has the right to be represented on that committee. International
organizations, governmental and non-governmental, in liaison with ISO, also take part in the work.
ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of
electrotechnical standardization.
The procedures used to develop this document and those intended for its further maintenance are
described in the ISO/IEC Directives, Part 1. In particular, the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
editorial rules of the ISO/IEC Directives, Part 2 (see www .iso .org/ directives).
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of
any patent rights identified during the development of the document will be in the Introduction and/or
on the ISO list of patent declarations received (see www .iso .org/ patents).
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constitute an endorsement.
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expressions related to conformity assessment, as well as information about ISO's adherence to the
World Trade Organization (WTO) principles in the Technical Barriers to Trade (TBT), see www .iso .org/
iso/ foreword .html.
This document was prepared by Technical Committee ISO/TC 202, Microbeam analysis, Subcommittee
SC 4, Scanning electron microscopy.
Any feedback or questions on this document should be directed to the user’s national standards body. A
complete listing of these bodies can be found at www .iso .org/ members .html.
Introduction
The scanning electron microscope (SEM) is a very versatile instrument, which is widely used in
production, development and scientific research across the world. While they are easy to operate and
provide results quickly, there are a number of notorious problems, which hinder operating them at
their best performance. These are the reasons for lack of excellent repeatability in SEM imaging and
measurements. The most bothersome ones among these are unintended motions of the sample stage
and the primary electron beam, geometry distortions, wrong image magnification, image blur (lack
of sharp focus), noise and electron beam-induced contamination. Quantification of these essential
performance parameters is very useful to ensure that all SEMs perform at manufacturers specifications
and at users’ own purpose. Quantified knowledge helps in the evaluation of measurement uncertainties,
and necessary repairs.
This document pertains to measurement methods for the following SEM performance parameters:
— Image sharpness (spatial resolution, primary electron beam focusing ability).
— Drifts (the sample stage, the electron beam and the electron-optical column).
— Cleanliness (lack of beam-induced contamination).
— Image magnification and linearity (both in X and Y directions).
— Background noise.
— Primary electron beam current.
These parameters will also be influenced by the SEM conditions such as the lifetime of source (emitter
conditions), lifetime of liner tube and apertures (contamination of the electron optical parts), time and
intensity of last cleaning of vacuum chamber by the plasma cleaning or Ultra Violet irradiation, the
sample preparation and final surface cleaning.
vi © ISO 2021 – All rights reserved

TECHNICAL SPECIFICATION ISO/TS 21383:2021(E)
Microbeam analysis — Scanning electron microscopy
— Qualification of the scanning electron microscope for
quantitative measurements
1 Scope
This document describes methods to qualify the scanning electron microscope with the digital imaging
system for quantitative and qualitative SEM measurements by evaluating essential scanning electron
microscope performance parameters to maintain the performance after installation of the instruments.
The items and evaluating methods of the performance parameters are selected by users for their own
purposes.
2 Normative references
The following documents are referred to in the text in such a way that some or all of their content
constitutes requirements of this document. For dated references, only the edition cited applies. For
undated references, the latest edition of the referenced document (including any amendments) applies.
ISO 16700:2016, Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image
magnification
ISO/IEC 17025:2017, General requirements for the competence of testing and calibration laboratories
ISO 22493, Microbeam analysis — Scanning electron microscopy — Vocabulary
ISO/TS 24597:2011, Microbeam analysis — Scanning electron microscopy — Methods of evaluating image
sharpness
3 Terms and definitions
For the purposes of this document, the terms and definitions given in ISO 22493 and the following apply.
ISO and IEC maintain terminological databases for use in standardization at the following addresses:
— ISO Online browsing platform: available at https:// www .iso .org/ obp
— IEC Electropedia: available at http:// www .electropedia .org/
3.1
scanning electron microscope
SEM
instrument that produces magnified imag
...