ISO 18114:2021
(Main)Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
This document specifies a method of determining relative sensitivity factors (RSFs) for secondary-ion mass spectrometry (SIMS) from ion-implanted reference materials. The method is applicable to specimens in which the matrix is of uniform chemical composition, and in which the peak concentration of the implanted species does not exceed one atomic percent.
Analyse chimique des surfaces — Spectrométrie de masse des ions secondaires — Détermination des facteurs de sensibilité relative à l'aide de matériaux de référence à ions implantés
General Information
- Status
- Published
- Publication Date
- 10-May-2021
- Technical Committee
- ISO/TC 201/SC 6 - Secondary ion mass spectrometry
- Drafting Committee
- ISO/TC 201/SC 6/WG 3 - Depth resolution for SIMS
- Current Stage
- 6060 - International Standard published
- Start Date
- 11-May-2021
- Due Date
- 08-Dec-2022
- Completion Date
- 11-May-2021
Relations
- Effective Date
- 23-Apr-2020
Overview
ISO 18114:2021 specifies a standardized method to determine relative sensitivity factors (RSFs) for secondary‑ion mass spectrometry (SIMS) using ion‑implanted reference materials. The method applies to specimens with a uniform matrix composition where the implanted species peak concentration does not exceed one atomic percent. The RSF enables quantification of an element’s concentration as a function of depth in samples of the same matrix when the detected ion signal is proportional to concentration.
Key Topics
- Principle: An isotopic RSF for an element–matrix pair is derived from a SIMS depth profile of an ion‑implanted external standard. The RSF calculation uses the implanted fluence, integrated analyte signal (background corrected), the reference isotope signal, and the sputtered depth of the analysis crater.
- Applicability limits: Use for uniform matrices and peak implanted concentrations ≤ 1 at.% to avoid strong matrix effects. If detector saturation occurs, intensity correction per ISO 20411 may allow application after correction.
- Reference materials: Prefer certified reference materials (CRMs). If CRMs are unavailable, use reference materials whose implanted fluence has been independently measured (for example by Rutherford backscattering or neutron activation analysis).
- Depth measurement: The sputtered crater depth is typically measured with a calibrated stylus profilometer and assumed constant per measurement cycle when calculating the removed depth.
- Measurement consistency: Analytical and instrument conditions must be the same for the implanted reference and the unknown sample to ensure valid RSF transfer.
Applications
- Calibration of SIMS instruments for quantitative depth profiling of trace elements in homogeneous matrices.
- Routine generation of RSFs for lab reference libraries to support comparison of depth profiles across samples and time.
- Quantitative analysis workflows where ion‑implanted standards provide known fluence and well‑characterized depth distributions.
Practical tips:
- Ensure the implanted peak is at least two times deeper than the onset depth of steady‑state sputtering as indicated by a stable matrix signal.
- Verify the implanted peak intensity is at least 100× the instrument background or detection limit to ensure robust RSF calculation.
- Record and report instrument model, primary beam species/energy/angle, secondary ion species/polarity, spectrometer and analytical conditions, and any deviations from procedure.
Related Standards
- ISO 20411 - Correction method for saturated intensity in single ion counting SIMS (referenced for intensity correction).
- ISO 18115 (all parts) - Surface chemical analysis - Vocabulary (terms and definitions used).
- Wilson R.G., Stevie F.A., Magee C.W., Secondary Ion Mass Spectrometry: A Practical Handbook (useful practical reference cited in ISO 18114).
This standard provides a consistent, practical approach to derive RSFs from ion‑implanted reference materials, improving the reliability and comparability of SIMS quantitative depth profiling.
Frequently Asked Questions
ISO 18114:2021 is a standard published by the International Organization for Standardization (ISO). Its full title is "Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials". This standard covers: This document specifies a method of determining relative sensitivity factors (RSFs) for secondary-ion mass spectrometry (SIMS) from ion-implanted reference materials. The method is applicable to specimens in which the matrix is of uniform chemical composition, and in which the peak concentration of the implanted species does not exceed one atomic percent.
This document specifies a method of determining relative sensitivity factors (RSFs) for secondary-ion mass spectrometry (SIMS) from ion-implanted reference materials. The method is applicable to specimens in which the matrix is of uniform chemical composition, and in which the peak concentration of the implanted species does not exceed one atomic percent.
ISO 18114:2021 is classified under the following ICS (International Classification for Standards) categories: 71.040.40 - Chemical analysis. The ICS classification helps identify the subject area and facilitates finding related standards.
ISO 18114:2021 has the following relationships with other standards: It is inter standard links to ISO 18114:2003. Understanding these relationships helps ensure you are using the most current and applicable version of the standard.
You can purchase ISO 18114:2021 directly from iTeh Standards. The document is available in PDF format and is delivered instantly after payment. Add the standard to your cart and complete the secure checkout process. iTeh Standards is an authorized distributor of ISO standards.
Standards Content (Sample)
INTERNATIONAL ISO
STANDARD 18114
Second edition
2021-05
Surface chemical analysis —
Secondary-ion mass spectrometry —
Determination of relative sensitivity
factors from ion-implanted reference
materials
Analyse chimique des surfaces — Spectrométrie de masse des ions
secondaires — Détermination des facteurs de sensibilité relative à
l'aide de matériaux de référence à ions implantés
Reference number
©
ISO 2021
© ISO 2021
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
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Published in Switzerland
ii © ISO 2021 – All rights reserved
Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Symbols and abbreviated terms . 1
5 Principle . 2
6 Apparatus . 2
7 Ion-implanted reference materials . 2
8 Procedure. 3
9 Test report . 3
Bibliography . 4
Foreword
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This document was prepared by Technical Committee ISO/TC 201, Surface chemical analysis,
Subcommittee SC 6, Secondary ion mass spectrometry.
This second edition cancels and replaces the first edition (ISO 18114:2003), which has been technically
revised.
The main changes compared to the previous edition are as follows:
— Formula (1) has been corrected;
— in Clause 5, Notes 1 and 2 have been modified.
Any feedback or questions on this document should be directed to the user’s national standards body. A
complete listing of these bodies can be found at www .iso .org/ members .html.
iv © ISO 2021 – All rights reserved
Introduction
Ion-implanted materials are commonly used in secondary-ion mass spectrometry for the calibration of
instruments. This document was prepared to provide a uniform method for determining the relative
sensitivity factor of an element in a specified matrix from an ion-implanted reference material, and to
show how the concentration of the element in a different sample of the same matrix material can be
determined.
INTERNATIONAL STANDARD ISO 18114:2021(E)
Surface chemical analysis — Secondary-ion mass
spectrometry — Determination of relative sensitivity
factors from ion-implanted reference materials
1 Scope
This document specifies a method of determining relative
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