IEC 60749-27:2006
(Main)Semiconductor devices - Mechanical and climatic test methods - Part 27: Electrostatic discharge (ESD) sensitivity testing - Machine model (MM)
Semiconductor devices - Mechanical and climatic test methods - Part 27: Electrostatic discharge (ESD) sensitivity testing - Machine model (MM)
Establishes a standard procedure for testing and classifying semiconductor devices according to their susceptibility to damage or degradation by exposure to a defined machine model (MM) electrostatic discharge (ESD). It may be used as an alternative test method to the human body model ESD test method. The objective is to provide reliable, repeatable ESD test results so that accurate classifications can be performed. This test method is applicable to all semiconductor devices and is classified as destructive
Dispositifs à semiconducteurs - Méthodes d'essais mécaniques et climatiques - Partie 27: Essai de sensibilité aux décharges électrostatiques (DES) - Modèle de machine (MM)
Etablit une procédure normalisée pour les essais et les classements des dispositifs à semiconducteurs en fonction de leur sensibilité aux dommages ou à la dégradation du fait de leur exposition à une décharge électrostatique (DES) sur un modèle de machine (MM) défini. Elle peut être utilisée comme une méthode d'essai en variante à la méthode d'essai de DES sur le modèle du corps humain. L'objectif est de fournir des résultats d'essai de DES fiables et reproductibles de manière à ce que des classifications précises puissent être réalisées. Cette méthode d'essai est applicable à tous les dispositifs à semiconducteurs et elle est classée destructive.
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Standards Content (Sample)
NORME CEI
INTERNATIONALE
IEC
60749-27
INTERNATIONAL
Deuxième édition
STANDARD
Second edition
2006-07
Dispositifs à semiconducteurs –
Méthodes d'essais mécaniques
et climatiques –
Partie 27:
Essai de sensibilité aux décharges
électrostatiques (DES) –
Modèle de machine (MM)
Semiconductor devices –
Mechanical and climatic test methods –
Part 27:
Electrostatic discharge (ESD) sensitivity
testing –
Machine model (MM)
Numéro de référence
Reference number
CEI/IEC 60749-27:2006
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NORME CEI
INTERNATIONALE
IEC
60749-27
INTERNATIONAL
Deuxième édition
STANDARD
Second edition
2006-07
Dispositifs à semiconducteurs –
Méthodes d'essais mécaniques
et climatiques –
Partie 27:
Essai de sensibilité aux décharges
électrostatiques (DES) –
Modèle de machine (MM)
Semiconductor devices –
Mechanical and climatic test methods –
Part 27:
Electrostatic discharge (ESD) sensitivity
testing –
Machine model (MM)
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CODE PRIX
M
PRICE CODE
Commission Electrotechnique Internationale
International Electrotechnical Commission
МеждународнаяЭлектротехническаяКомиссия
Pour prix, voir catalogue en vigueur
For price, see current catalogue
– 2 – 60749-27 CEI:2006
SOMMAIRE
AVANT-PROPOS.4
1 Domaine d’application .8
2 Références normatives.8
3 Termes et définitions .8
4 Appareillage .10
4.1 Générateur de forme de DES du MM.10
4.2 Appareil de vérification de la forme d'onde .10
5 Exigences de forme d'onde de courant du MM.12
5.1 Généralités.12
5.2 Qualification et vérification de la forme d'onde .16
6 Considérations relatives à l'évaluation spécifique des dispositifs .16
6.1 Taille de l'échantillon et conditions d'essai .16
6.2 Broche du cas le plus défavorable ou carte de qualification standard .18
7 Procédure de classification.20
7.1 Exigence pour les dispositifs .20
7.2 Sélection des dispositifs .20
7.3 Caractérisation des dispositifs.20
7.4 Niveaux de contrainte des dispositifs.20
7.5 Combinaisons de broches .22
7.6 Ordre des essais .22
8 Critères de défaillance.22
9 Critères de classification .24
10 Resumé.24
Figure 1 – Équivalent au générateur de forme d'onde de DES du MM.12
Figure 2 – Forme d'onde de courant type au travers d'un fil court-circuitant .14
Figure 3 – Forme d'onde de courant type à travers une résistance de 500 Ω .16
Tableau 1 – Spécification de formes d'onde.14
Tableau 2 – Combinaisons de broches pour circuits intégrés .22
60749-27 IEC:2006 – 3 –
CONTENTS
FOREWORD.5
1 Scope.9
2 Normative references .9
3 Terms and definitions .9
4 Equipment .11
4.1 MM ESD waveform generator .11
4.2 Waveform verification equipment.11
5 MM current waveform requirements.13
5.1 General .13
5.2 Waveform qualification and verification .17
6 Device specific evaluation considerations.17
6.1 Sample size and test conditions .17
6.2 Worst-case pin or standard qualification board .19
7 Classification procedure .21
7.1 Device requirements .21
7.2 Device selection .21
7.3 Device characterization .21
7.4 Device stress levels .21
7.5 Pin combinations .23
7.6 Order of test.23
8 Failure criteria .23
9 Classification criteria .25
10 Summary.25
Figure 1 – MM ESD waveform generator equivalent.13
Figure 2 – Typical current waveform through a shorting wire.15
Figure 3 – Typical current waveform through a 500 Ω resistor.17
Table 1 – Waveform specification .15
Table 2 – Pin combinations for integrated circuits .23
– 4 – 60749-27 CEI:2006
COMMISSION ÉLECTROTECHNIQUE INTERNATIONALE
____________
DISPOSITIFS À SEMICONDUCTEURS –
MÉTHODES D’ESSAIS MÉCANIQUES ET CLIMATIQUES –
Partie 27: Essai de sensibilité aux décharges électrostatiques (DES) –
Modèle de machine (MM)
AVANT-PROPOS
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La Norme internationale CEI 60749-27 a été établie par le comité d'études 47 de la CEI:
Dispositifs à semiconducteurs.
Cette deuxième édition annule et remplace la première édition, publiée en 2003, et a été
révisée en collaboration avec le comité d’études 101. Bien qu’elle ne contienne pas de
modifications techniques majeures, référence est maintenant faite, si nécessaire, à la
CEI 61340-3-2.
60749-27 IEC:2006 – 5 –
INTERNATIONAL ELECTROTECHNICAL COMMISSION
___________
SEMICONDUCTOR DEVICES –
MECHANICAL AND CLIMATIC TEST METHODS –
Part 27: Electrostatic discharge (ESD) sensitivity testing –
Machine model (MM)
FOREWORD
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8) Attention is drawn to the Normative references cited in this publication. Use of the referenced publications is
indispensable for the correct application of this publication.
9) Attention is drawn to the possibility that some of the elements of this IEC Publication may be the subject of
patent rights. IEC shall not be held responsible for identifying any or all such patent rights.
International Standard IEC 60749-27 has been prepared by IEC technical committee 47:
Semiconductor devices.
This second edition cancels and replaces the first edition, published in 2003, and has been
revised in collaboration with technical committee 101. Whilst it does not contain any major
technical changes, reference is now made, where necessary, to IEC 61340-3-2.
– 6 – 60749-27 CEI:2006
Le texte de cette norme est issu des documents suivants:
FDIS Rapport de vote
47/1861/FDIS 47/1873/RVD
Le rapport de vote indiqué dans le tableau ci-dessus donne toute information sur le vote ayant
abouti à l'approbation de cette norme.
Cette publication a été rédigée selon les Directives ISO/CEI, Partie 2.
Une liste de toutes les parties de la série CEI 60749, présentées sous le titre général
Dispositifs à semiconducteurs – Méthodes d’essais mécaniques et climatiques peut être
consultée sur le site web de la CEI.
Le comité a décidé que le contenu de cette publication ne sera pas modifié avant la date de
maintenance indiquée sur le site web de la CEI sous "http://webstore.iec.ch" dans les
données relatives à la publication recherchée. A cette date, la publication sera
• reconduite,
• supprimée,
• remplacée par une édition révisée, ou
• amendée.
60749-27 IEC:2006 – 7 –
The text of this standard is based on the following documents:
FDIS Report on voting
47/1861/FDIS 47/1873/RVD
Full information on the voting for the approval of this standard can be found in the report on
voting indicated in the above table.
This publication has been drafted in accordance with the ISO/IEC Directives, Part 2.
A list of all parts of IEC 60749 series, under the general title Semiconductor devices –
Mechanical and climatic test methods can be found on the IEC website.
The committee has decided that the contents of this publication will remain unchanged until
the maintenance result date indicated on the IEC web site under "http://webstore.iec.ch" in
the data related to the specific publication. At this date, the publication will be
• reconfirmed;
• withdrawn;
• replaced by a revised edition, or
• amended.
– 8 – 60749-27 CEI:2006
DISPOSITIFS À SEMICONDUCTEURS –
MÉTHODES D’ESSAIS MÉCANIQUES ET CLIMATIQUES –
Partie 27: Essai de sensibilité aux décharges électrostatiques (DES) –
Modèle de machine (MM)
1 Domaine d’application
La présente partie de la CEI 60749 établit une procédure normalisée pour les essais et les
classements des dispositifs à semiconducteurs en fonction de leur sensibilité aux dommages
ou à la dégradation du fait de leur exposition à une décharge électrostatique (DES) sur un
modèle de machine (MM) défini. Elle peut être utilisée comme une méthode d'essai en
variante à la méthode d'essai de DES sur le modèle du corps humain. L’objectif est de fournir
des résultats d’essai de DES fiables et reproductibles de manière à ce que des classifications
précises puissent être réalisées.
Cette méthode d'essai est applicable à tous les dispositifs à semiconducteurs et elle est
classée destructive.
L’essai de DES pour les dispositifs à semiconducteurs est choisi entre la présente méthode
d’essai, celle du modèle du corps humain (HBM - voir la CEI 60749-26) ou d'autres méthodes
d'essai de série de la CEI 60749. Les méthodes d’essai MM et HBM donnent des résultats
similaires mais pas identiques. Sauf spécification contraire, la méthode d’essai HBM sera
choisie.
NOTE 1 Cette méthode d’essai ne simule pas vraiment les décharges de machines réelles ou d’outils métalliques
parce que cette méthode utilise une inductance parasite forte du circuit d'essai, alors que les machines réelles ou
les outils métalliques dont le temps de montée de décharge est approximativement 100 ps n’ont pas d’inductance.
NOTE 2 Certains articles de cette méthode d'essai sont conformes à la CEI 61340-3-2.
2 Références normatives
Les documents de référence suivants sont indispensables pour l’application du présent
document. Pour les références datées, seule l’édition citée s’applique. Pour les références
non datées, la dernière édition du document de référence s’applique (y compris les éventuels
amendements.
CEI 61340-3-2, Electrostatique – Partie 3-2: Méthodes pour la simulation des effets
électrostatiques – Formes d'onde d'essai des décharges électrostatiques pour les modèles de
machine (MM)
CEI 60749-26, Dispositifs à semiconducteurs – Méthodes d’essais mécaniques et climatiques
– Partie 26: Essai de sensibilité aux décharges électrostatiques (DES) – Modèle du corps
humain (HBM)
3 Termes et définitions
Pour les besoins du présent document les termes et définitions suivants sont applicables.
3.1
dispositif en essai
DEE
dispositif à semiconducteur soumis à l'essai de DES MM
60749-27 IEC:2006 – 9 –
SEMICONDUCTOR DEVICES –
MECHANICAL AND CLIMATIC TEST METHODS –
Part 27: Electrostatic discharge (ESD) sensitivity testing –
Machine model (MM)
1 Scope
This part of IEC 60749 establishes a standard procedure for testing and classifying
semiconductor devices according to their susceptibility to damage or degradation by exposure
to a defined machine model (MM) electrostatic discharge (ESD). It may be used as an
alternative test method to the human body model ESD test method. The objective is to
provide reliable, repeatable ESD test results so that accurate classifications can be performed.
This test method is applicable to all semiconductor devices and is classified as destructive.
ESD testing of semiconductor devices is selected from this test method, the human body
model (HBM – see IEC 60749-26) or other test methods in the IEC 60749 series. The MM and
HBM test methods produce similar but not identical results. Unless otherwise specified, the
HBM test method is the one selected.
NOTE 1 This test method does not truly simulate discharge from real machines or metallic tools because the test
method uses high parasitic inductance of the test circuit, whereas real machines and metallic tools, whose
discharge rise time is approximately 100 ps, have no inductance.
NOTE 2 Certain clauses in this test method are in accordance with IEC 61340-3-2.
2 Normative references
The following referenced documents are indispensable for the application of this document.
For dated references, only the edition cited applies. For undated references, the latest edition
of the referenced document (including any amendments) applies.
IEC 61340-3-2, Electrostatics – Part 3-2: Methods for simulation of electrostatic effects –
Machine model (MM – Component testing ) electrostatic discharge test waveforms
IEC 60749-26: Semiconductor devices – Mechanical and climatic test methods – Part 26:
Electrostatic discharge (ESD) sensitivity testing – Human body model (HBM)
3 Terms and definitions
For the purposes of this document, the following terms and definitions apply.
3.1
device under test
DUT
semiconductor product subjected to MM ESD test
– 10 – 60749-27 CEI:2006
3.2
défaillance du DEE
condition pour laquelle un DEE n'est pas conforme à un ou plusieurs paramètres spécifiés à
la fin de l'essai de DES
3.3
tension de tenue de DES
niveau de tension de DES maximum appliqué qui ne provoque pas de dépassement des
limites de défaillance pourvu que tous les DEE soumis à contrainte à des niveaux inférieurs
aient également subi les essais avec succès
NOTE L'Article 3 de cette méthode d'essai est conforme à la CEI 61340-3-2 sauf pour les références particulières
aux dispositifs.
4 Appareillage
4.1 Générateur de forme de DES du MM
Cet appareil produit une impulsion de décharge de courant électrostatique simulant un
événement de DES du MM pour l'application du DEE. Le circuit de générateur de forme
équivalent ainsi que les charges d'évaluation de l'appareil d'essai sont illustrées à la Figure 1.
4.2 Appareil de vérification de la forme d'onde
4.2.1 Généralités
L'appareil capable de vérifier l'impulsion de la forme d'onde de courant du MM est défini dans
la présente norme. Cet appareil comprend, entre autres, un système d'enregistrement de la
forme d'onde, une résistance à haute tension et un transducteur de courant.
4.2.2 Système d'enregistrement de la forme d'onde
Le système d'enregistrement de la forme d'onde doit avoir une largeur de bande à action
unique minimale de 350 MHz.
4.2.3 Charges d'évaluation
Deux charges d'évaluation sont nécessaires pour vérifier la fonctionnalité du générateur de
forme d'onde:
a) charge 1: un fil court-circuitant
b) charge 2: une résistance de 500 Ω à inductance faible de valeur nominale appropriée avec
une tolérance de ±1 % pour les tensions qui seront utilisées pour la qualification de la
forme d'onde.
La longueur des fils des charges d'évaluation (fil court-circuitant ou résistance) aussi courte
que possible doit être compatible avec une connexion de la charge d'évaluation aux broches
de référence appropriées (A et B à la Figure 1) lors du passage à travers le transducteur de
courant.
4.2.4 Transducteur de courant
Le transducteur de courant doit avoir une largeur de bande minimale de 350 MHz.
60749-27 IEC:2006 – 11 –
3.2
DUT failure
condition in which a DUT does not meet one or more specified parameters as a result of ESD
test
3.3
ESD withstand voltage
maximum applied ESD voltage level that does not cause failure parameter limits to be
exceeded provided that all DUTs stressed at lower levels have also passed
NOTE Clause 3 of this test method is in accordance with IEC 61340-3-2 except for the specific reference to
devices.
4 Equipment
4.1 MM ESD waveform generator
This equipment produces an electrostatic discharge c
...
IEC 60749-27 ®
Edition 2.1 2012-09
CONSOLIDATED VERSION
INTERNATIONAL
STANDARD
NORME
INTERNATIONALE
colour
inside
Semiconductor devices – Mechanical and climatic test methods –
Part 27: Electrostatic discharge (ESD) sensitivity testing – Machine model (MM)
Dispositifs à semiconducteurs – Méthodes d'essais mécaniques et climatiques –
Partie 27: Essai de sensibilité aux décharges électrostatiques (DES) – Modèle de
machine (MM)
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IEC 60749-27 ®
Edition 2.1 2012-09
CONSOLIDATED VERSION
INTERNATIONAL
STANDARD
NORME
INTERNATIONALE
colour
inside
Semiconductor devices – Mechanical and climatic test methods –
Part 27: Electrostatic discharge (ESD) sensitivity testing – Machine model (MM)
Dispositifs à semiconducteurs – Méthodes d'essais mécaniques et climatiques –
Partie 27: Essai de sensibilité aux décharges électrostatiques (DES) – Modèle
de machine (MM)
INTERNATIONAL
ELECTROTECHNICAL
COMMISSION
COMMISSION
ELECTROTECHNIQUE
INTERNATIONALE
ICS 31.080.01 ISBN 978-2-8322-0407-8
– 2 – 60749-27 IEC:2006+A1:2012
CONTENTS
FOREWORD . 3
1 Scope . 5
2 Normative references . 5
3 Terms and definitions . 5
4 Equipment . 6
4.1 MM ESD waveform generator . 6
4.2 Waveform verification equipment . 6
5 MM current waveform requirements . 7
5.1 General . 7
5.2 Waveform qualification and verification . 10
5.3 Extra consideration for waveform specifications . 9
6 Device specific evaluation considerations . 10
6.1 Sample size and test conditions . 10
6.2 Worst-case pin or standard qualification board . 10
7 Classification procedure . 11
7.1 Device requirements . 11
7.2 Device selection . 11
7.3 Device characterization . 11
7.4 Device stress levels . 11
7.5 Pin combinations . 12
7.6 Order of test . 12
8 Failure criteria . 12
9 Classification criteria . 12
10 Summary . 13
Figure 1 – MM ESD waveform generator equivalent . 7
Figure 2 – Typical current waveform through a shorting wire . 8
Figure 3 – Typical current waveform through a 500 Ω resistor . 9
Table 1 – Waveform specification . 8
Table 2 – Pin combinations for integrated circuits . 12
60749-27 IEC:2006+A1:2012 – 3 –
INTERNATIONAL ELECTROTECHNICAL COMMISSION
___________
SEMICONDUCTOR DEVICES –
MECHANICAL AND CLIMATIC TEST METHODS –
Part 27: Electrostatic discharge (ESD) sensitivity testing –
Machine model (MM)
FOREWORD
1) The International Electrotechnical Commission (IEC) is a worldwide organization for standardization comprising
all national electrotechnical committees (IEC National Committees). The object of IEC is to promote
international co-operation on all questions concerning standardization in the electrical and electronic fields. To
this end and in addition to other activities, IEC publishes International Standards, Technical Specifications,
Technical Reports, Publicly Available Specifications (PAS) and Guides (hereafter referred to as “IEC
Publication(s)”). Their preparation is entrusted to technical committees; any IEC National Committee interested
in the subject dealt with may participate in this preparatory work. International, governmental and non-
governmental organizations liaising with the IEC also participate in this preparation. IEC collaborates closely
with the International Organization for Standardization (ISO) in accordance with conditions determined by
agreement between the two organizations.
2) The formal decisions or agreements of IEC on technical matters express, as nearly as possible, an international
consensus of opinion on the relevant subjects since each technical committee has representation from all
interested IEC National Committees.
3) IEC Publications have the form of recommendations for international use and are accepted by IEC National
Committees in that sense. While all reasonable efforts are made to ensure that the technical content of IEC
Publications is accurate, IEC cannot be held responsible for the way in which they are used or for any
misinterpretation by any end user.
4) In order to promote international uniformity, IEC National Committees undertake to apply IEC Publications
transparently to the maximum extent possible in their national and regional publications. Any divergence
between any IEC Publication and the corresponding national or regional publication shall be clearly indicated in
the latter.
5) IEC itself does not provide any attestation of conformity. Independent certification bodies provide conformity
assessment services and, in some areas, access to IEC marks of conformity. IEC is not responsible for any
services carried out by independent certification bodies.
6) All users should ensure that they have the latest edition of this publication.
7) No liability shall attach to IEC or its directors, employees, servants or agents including individual experts and
members of its technical committees and IEC National Committees for any personal injury, property damage or
other damage of any nature whatsoever, whether direct or indirect, or for costs (including legal fees) and
expenses arising out of the publication, use of, or reliance upon, this IEC Publication or any other IEC
Publications.
8) Attention is drawn to the Normative references cited in this publication. Use of the referenced publications is
indispensable for the correct application of this publication.
9) Attention is drawn to the possibility that some of the elements of this IEC Publication may be the subject of
patent rights. IEC shall not be held responsible for identifying any or all such patent rights.
This consolidated version of the official IEC Standard and its amendment has been prepared
for user convenience.
IEC 60749-27 edition 2.1 contains the second edition (2006) [documents 47/1861/FDIS and
47/1873/RVD] and its amendment 1 (2012) [documents 47/2135/FDIS and 47/2144/RVD].
A vertical line in the margin shows where the base publication has been modified by
amendment 1. Additions and deletions are displayed in red, with deletions being struck
through.
– 4 – 60749-27 IEC:2006+A1:2012
International Standard IEC 60749-27 has been prepared by IEC technical committee 47:
Semiconductor devices.
This second edition cancels and replaces the first edition, published in 2003, and has been
revised in collaboration with technical committee 101. Whilst it does not contain any major
technical changes, reference is now made, where necessary, to IEC 61340-3-2.
A list of all parts of IEC 60749 series, under the general title Semiconductor devices –
Mechanical and climatic test methods can be found on the IEC website.
The committee has decided that the contents of the base publication and its amendments will
remain unchanged until the stability date indicated on the IEC web site under
"http://webstore.iec.ch" in the data related to the specific publication. At this date, the
publication will be
• reconfirmed,
• withdrawn,
• replaced by a revised edition, or
• amended.
IMPORTANT – The “colour inside” logo on the cover page of this publication indicates
that it contains colours which are considered to be useful for the correct understanding
of its contents. Users should therefore print this publication using a colour printer.
60749-27 IEC:2006+A1:2012 – 5 –
SEMICONDUCTOR DEVICES –
MECHANICAL AND CLIMATIC TEST METHODS –
Part 27: Electrostatic discharge (ESD) sensitivity testing –
Machine model (MM)
1 Scope
This part of IEC 60749 establishes a standard procedure for testing and classifying
semiconductor devices according to their susceptibility to damage or degradation by exposure
to a defined machine model (MM) electrostatic discharge (ESD). It may be used as an
alternative test method to the human body model ESD test method. The objective is to
provide reliable, repeatable ESD test results so that accurate classifications can be performed.
This test method is applicable to all semiconductor devices and is classified as destructive.
ESD testing of semiconductor devices is selected from this test method, the human body
model (HBM – see IEC 60749-26) or other test methods in the IEC 60749 series. The MM and
HBM test methods produce similar but not identical results. Unless otherwise specified, the
HBM test method is the one selected.
NOTE 1 This test method does not truly simulate discharge from real machines or metallic tools because the test
method uses high parasitic inductance of the test circuit, whereas real machines and metallic tools, whose
discharge rise time is approximately 100 ps, have no inductance.
NOTE 2 Certain clauses in this test method are in accordance with IEC 61340-3-2.
2 Normative references
The following referenced documents are indispensable for the application of this document.
For dated references, only the edition cited applies. For undated references, the latest edition
of the referenced document (including any amendments) applies.
IEC 61340-3-2, Electrostatics – Part 3-2: Methods for simulation of electrostatic effects –
Machine model (MM – Component testing ) electrostatic discharge test waveforms
IEC 60749-26: Semiconductor devices – Mechanical and climatic test methods – Part 26:
Electrostatic discharge (ESD) sensitivity testing – Human body model (HBM)
3 Terms and definitions
For the purposes of this document, the following terms and definitions apply.
3.1
device under test
DUT
semiconductor product subjected to MM ESD test
3.2
DUT failure
condition in which a DUT does not meet one or more specified parameters as a result of ESD
test
– 6 – 60749-27 IEC:2006+A1:2012
3.3
ESD withstand voltage
maximum applied ESD voltage level that does not cause failure parameter limits to be
exceeded provided that all DUTs stressed at lower levels have also passed
NOTE Clause 3 of this test method is in accordance with IEC 61340-3-2 except for the specific reference to
devices.
3.4
ringing
noise component caused by a large inductance in the discharge circuit
4 Equipment
4.1 MM ESD waveform generator
This equipment produces an electrostatic discharge current pulse simulating a MM ESD event
for application to the DUT. The equivalent waveform generator circuit and tester evaluation
loads are illustrated in Figure 1.
4.2 Waveform verification equipment
4.2.1 General
Equipment capable of verifying the MM current waveform is defined in this standard. This
equipment includes but is not limited to a waveform recording system, a high voltage resistor
and a current transducer.
4.2.2 Waveform recording system
The waveform recording system shall have a minimum single shot bandwidth of 350 MHz.
4.2.3 Evaluation loads
Two evaluation loads are necessary to verify the functionality of the waveform generator:
a) load 1: a shorting wire;
b) load 2: a 500 Ω with a tolerance of ±1 % low inductance resistor appropriate rated for the
voltages that will be used for waveform qualification.
The lead length of the evaluation loads (shorting wire or resistor) shall be as short as possible
consistent with connecting the evaluation load to the appropriate reference terminals (A and B
in Figure 1) while passing through the current transducer.
4.2.4 Current transducer
The current transducer shall have a minimum bandwidth of 350 MHz.
60749-27 IEC:2006+A1:2012 – 7 –
IEC 678/02
Key
1 MM ESD waveform generator (nominally 200 pF)
2 Terminal A
3 Switch
4 Terminal B
5 DUT
6 Evaluation load
7 Shorting wire
8 Resistance R = 500 Ω
9 Current transducer
Figure 1 – MM ESD waveform generator equivalent
Requirements for Figure 1:
1. The evaluation loads (7 and 8) are specified in 4.2.3.
2. The current transducer (9) is specified in 4.2.4.
3. The reversal of terminals A (2) and B (4) to achieve dual polarity is not permitted.
4. The switch (3) is closed 10 ms to 100 ms after the pulse delivery period of each single MM
pulse to ensure that the DUT and any test fixture are not left in a charged state.
NOTE 1 The performance of the waveform generator is strongly influenced by parasitic capacitance and
inductance.
NOTE 2 Precautions must be taken in the design of the waveform generator to avoid recharge transients and
double pulses.
NOTE 3 A resistance in series with the switch would ensure a slow discharge of the DUT.
NOTE 4 Clause 4 of this test method is in accordance with IEC 61340-3-2 except for the specific reference to
devices.
5 MM current waveform requirements
5.1 General
Prior to DUT testing, MM ESD waveform generator qualification shall ensure waveform
integrity of the discharge current through both a shorting wire and a resistive load. The
shorting wire waveform requirements are specified in Figure 2 for all positive and negative
voltages defined in Table 1, while the resistive load waveform requirements for ±400 V are
shown in Figure 3 and Table 1.
– 8 – 60749-27 IEC:2006+A1:2012
Table 1 – Waveform specification
Equivalent I peak current I peak current I current through a
p1 PR 100
Level voltage through a shorting wire
through a 500 Ω resistor 500 Ω resistor at 100 ns
V A (±15 %)
A A (±15 %)
1 100 1,7 – –
2 200 3,5 – –
3 400 7,0 0,29
4 800 14,0 – –
Equivalent I peak current through I peak current I current through a
p1 PR 100
voltage a shorting wire
Level through a 500 Ω resistor 500 Ω resistor at 100 ns
a
V
A (± 15 %) A
A (± 15 %)
1 100 1,7 (1,5) – –
2 200 3,5 (3,0) – –
3 400 7,0 (6,0)
4 800 14,0 (12,0) – –
a
Values in parentheses are the peak current value without ringing.
I
p1
t
pm
t
t
t
t
0 2
I
p2
20 ns per division
IEC 682/02
Figure 2 – Typical current waveform through a shorting wire
60749-27 IEC:2006+A1:2012 – 9 –
Requirements for Figure 2:
The current pulse shall meet the following requirements:
I is the maximum peak current is specified in Table 1;
p1
I is the second peak current shall be between 67 % and 90 % of the absolute value
p2
obtained for I for each level;
p1
t is the period of the major pulse shall be between 63 ns and 91 ns. The measurement
pm
shall be made between the first zero crossing point, t , and the third zero crossing point, t .
1 3
The inductance (L) which is related to t shall be controlled to meet the above specified
pm
pulse period. The recommended value is 750 nH.
I
PR
I
20 ns per division
IEC 683/02
Figure 3 – Typical current waveform through a 500 Ω resistor
Requirements for Figure 3:
The current pulse through a 500 Ω resistor shall meet the following characteristics:
I is the maximum peak current shall be within the range specified in Table 1;
PR
I is the current at 100 ns is defined in Table 1.
5.3 Extra consideration for waveform specifications
The peak current I without ringing shall be verified against the values in Table 1.
p1
– 10 – 60749-27 IEC:2006+A1:2012
5.2 Waveform qualification and verification
Equipment qualification shall be performed during initial acceptance testing. Re-qualification
is required whenever equipment repairs are made that may affect the waveform. Additionally,
the waveforms shall be verified periodically. If a test fixture or circuit board is used to perform
DUT testing, the test fixture (board) shall also be used during equipment qualification tests. In
case the waveform no longer meets the waveform parameters described in Table 1 and
Figures 2 and 3, all ESD testing performed after the previous satisfactory waveform check
shall be considered invalid.
NOTE Clause 5 of this test method is in accordance with IEC 61340-3-2 except for the specific reference to
devices.
6 Device specific evaluation considerations
6.1 Sample size and test conditions
In the semiconductor industry, the typical ESD evaluation uses a sample size of three devices,
each of which is tested using one positive and one negative pulse with a pulse interval of
300 ms.
6.2 Worst-case pin or standard qualification board
6.2.1 General
Equipment qualification shall be made by discharge current measurement with a worst-case
pin combination of DUT board, as specified in 6.2.2. This method shall be used if the
equipment is constructed using a single discharge generator that can be connected to all pins
of the socket on the DUT board by switching of relays.
Multiple discharge generators shall be qualified using the standard qualification board
specified in 6.2.3. This method shall be used if the equipment is constructed to use a large
number of pairs of pins of the DUT board and each test circuit is connected to only a single
pin of the DUT board.
6.2.2 Worst-case pin
The worst-case pin combination for each socket and DUT board shall be identified and
documented. It is recommended that the manufacturers supply the worst-case pin data with
each DUT board. The pin combination with the waveform closest to the limits (see Table 1)
shall be designated for waveform verification.
The worst-case pin combination shall be identified by the following procedure:
a) For each test socket, identify the socket pin with the shortest wiring path from the pulse
generating circuit to the test socket. Connect this pin to terminal B (where it will remain
the reference pin throughout the worst case pin search) and connect one of the remaining
pins to terminal A. Attach a shorting wire between these pins with the current probe
around the shorting wire, as close to terminal B as practicable.
b) Apply a positive 400 V pulse and a negative 400 V pulse and verify that the waveform
meets the requirements defined in Table 1 for both positive and negative pulses.
c) Repeat steps a) and b) until all socket pins have been evaluated.
d) Determine the worst-case pin pair (within the limits and closest to the minimum or
maximum parameter values as specified in Table 1) to be used for future waveform
verification.
60749-27 IEC:2006+A1:2012 – 11 –
e) For initial board check-out, connect a 500 Ω resistor between the worst-case pins
previously identified with the shorting wire in step d). Apply a positive and negative 400 V
pulse and verify that the waveform meets the requirements defined in Table 1.
NOTE If the test socket/test board has already been characterized for worst-case pin on HBM, then that pin
combination is acceptable for use with MM waveform verification. As an alternative to the worst-case pin search,
the reference pin pair may be identified for each test socket of each test fixture. The reference pin combination
should be identified by determining the socket pin with the shortest wiring path from the pulse generating circuit to
the test socket. Connect this pin to terminal B and then connect the socket pin with the longest wiring path from the
pulse generating circuit to the test socket to terminal A (normally provided by the manufacturer). Attach a shorting
wire between these pins with the current probe around the shorting wire. Follow the procedure in step b). For the
initial board check-out connect a 500 Ω resistor between the reference pins. Apply a positive and negative 400 V
pulse and verify that the waveform meets the parameters in Table 1.
6.2.3 Standard qualification board
The standard qualification board shall satisfy the following requirements:
a) the size for the standard qualification board shall be the same size as is used for the DUT
board;
b) the specific length of internal wires of the standard qualification board, between equipment
and the terminals used to connect with evaluation loads, shall be specified in the
applicable specification;
c) the total length of each circuit pair in all DUT boards shall be shorter than/equal to the
length of the internal wire pairs in the standard qualification board and the evaluation load
specified in 4.2.3.
7 Classification procedure
7.1 Device requirements
The devices used for classification testing shall have completed all normal manufacturing
operations.
7.2 Device selection
Prior to ESD testing, d.c. parametric and functional testing at room temperature and, if
applicable, high temperature shall be performed on all devices submitted for ESD testing. The
test devices shall meet device data sheet requirements for these parameters.
7.3 Device characterization
A sample of devices (e.g. three) for each voltage level shall be characterized for the device
ESD failure threshold using the voltage steps shown in Table 1. Finer voltage steps may
optionally be used to obtain a more accurate measure of the failure threshold. ESD testing
should begin at the lowest step in Table 1. The ESD test shall be performed at room
temperature.
7.4 Device stress levels
Each sample of devices (e.g. three) shall be stressed at one voltage level using one positive
and one negative pulse with a minimum of 0,3 s between pulses per pin for all pin
combinations specified in Table 2. It is permitted to use a separate sample of devices (e.g.
three) for each pin combination specified in Table 2. It is permitted to use the same sample
(e.g. three) at the next highest voltage stress level if all devices pass the failure criteria
specified in Clause 8 after ESD exposure to a specified voltage level.
– 12 – 60749-27 IEC:2006+A1:2012
7.5 Pin combinations
The pin combinations to be used are given in Table 2. The actual number of pin combinations
depends on the number of power pin groups. Like-named power pins (V , V , V , V ,
CC1 CC2 SS1 SS2
GND, etc.) that are directly connected by metal (inside the package) may be tied together and
treated as one pin for terminal B connection. Otherwise, each power pin shall be treated as a
separate power pin. Programming pins that do not draw current should be considered as I/O
pins (example: V pins on memory devices). Active discrete devices (FETs, transistors, etc.)
PP
shall be tested using all possible pin-pair combinations (one pin connected to terminal A,
another pin connected to terminal B) regardless of pin name or function. All pins configured
as “no connect” pins shall be verified as “no-connect” and left open (floating) at all times.
Pins labelled “no-connect”, that in fact are connected, shall be tested as non-supply pins.
Table 2 – Pin combinations for integrated circuits
Connect individually to Connect to terminal B Floating pins
Pin combination
terminal A (ground) (unconnected)
a
1 All pins one at a time, First power pin(s) All pins except PUT
except the pin(s) connected and first power pin(s)
to terminal B
2 All pins one at a time, Second power pin(s) All pins except PUT and
except the pin(s) connected second power pin(s)
to terminal B
th
3 All pins one at a time, N power pin(s) All pins except PUT and
th
except the pin(s) connected N power pin(s)
to terminal B
4 Each non-supply pin, one at All other non-supply pins All power pins
a time collectively except PUT
a
PUT: Pin under test.
7.6 Order of test
If a different sample group is ESD tested at each stress level, it is permitted to perform the d.c.
parametric and functional ATE (automatic test equipment) testing after all sample groups
have been ESD tested.
8 Failure criteria
A device will be defined as a failure if, after exposure to ESD pulses, it no longer meets the
device data sheet requirements using parametric and functional testing. If testing is required
at a number of different temperatures, testing shall be performed at the lowest temperature
first.
9 Classification criteria
All samples used shall meet the test requirements of Clause 7 up to a particular voltage level
in order for the device to be classified as meeting a particular withstand classification.
CLASS A: Any device that fails after exposure to an ESD pulse of 200 V or less.
CLASS B: Any device that passes after exposure to an ESD pulse of 200 V, but fails after
exposure to an ESD pulse of 400 V.
CLASS C: Any device that passes after exposure to an ESD pulse of 400 V.
60749-27 IEC:2006+A1:2012 – 13 –
10 Summary
The following details shall be specified in the applicable specification:
a) test method to be selected from human body model or machine model (see Clause 1);
b) frequency of equipment qualification (see 5.2);
c) worst case pin pair and DUT board used for equipment qualification if it is used (see 6.2);
d
...










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