ASTM E3034-20
(Guide)Standard Guide for Workforce Education in Nanotechnology Pattern Generation
Standard Guide for Workforce Education in Nanotechnology Pattern Generation
SIGNIFICANCE AND USE
5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research.
5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this standard may require a post-secondary two-year science or technology background to be understood sufficiently.
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of pattern generation methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology field.
5.4 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education.
SCOPE
1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in nanoscale pattern definition.
1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers.
1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard.
1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.
1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
General Information
- Status
- Published
- Publication Date
- 31-Aug-2020
- Technical Committee
- E56 - Nanotechnology
- Drafting Committee
- E56.07 - Education and Workforce Development
Relations
- Effective Date
- 01-Oct-2006
Overview
ASTM E3034-20: Standard Guide for Workforce Education in Nanotechnology Pattern Generation provides a comprehensive educational framework for institutions and organizations involved in training the nanotechnology workforce. This standard is developed to outline the minimum knowledge base and core topics needed for workforce education in pattern generation related to nanotechnology. Designed for undergraduate-level education programs, this guide supports the preparation of individuals for diverse roles in nanotechnology research, development, and manufacturing, particularly in areas involving nanoscale pattern definition.
ASTM E3034-20 caters to organizations seeking to develop or evaluate educational curricula relevant to nanomanufacturing, including both theoretical concepts and practical applications. While the standard lists essential topic areas, it allows flexibility for educational institutions to adapt content to local industry demands and regulatory requirements.
Key Topics
Educational programs aligned with ASTM E3034-20 should address foundational subjects to prepare students for workforce demands in nanotechnology. Essential key topics covered in this standard include:
- Layout Design: Fundamental principles around defining function, partitioning, and simulation required for pattern generation.
- Optical Lithography: Including diffraction, interference, photolithography process steps, light sources, and photoresist materials.
- X-Ray Lithography: Coverage of both traditional and extreme ultraviolet (EUV) lithography techniques.
- Direct Writing Methods: Electron beam, ion beam, laser lithography, and scanning probe microscope lithography, including process steps and system components.
- Nano-Imprint Lithography (NIL): Both thermal and UV-based NIL processes, equipment, material selection, alignment, and defect control.
- Molecular Self-Assembly and Related Techniques: Techniques such as block co-polymer lithography and nano-sphere lithography, as well as essential materials and phase separation processes.
- General Background Knowledge: College-level algebra, chemistry, physics, statistics, and an understanding of environmental, health, and safety (EHS) issues unique to nanoscale materials.
Applications
Adoption of ASTM E3034-20 delivers significant practical benefits to educators and employers in the nanotechnology sector:
- Curriculum Development: Offers a structured outline for colleges, universities, and training centers to develop workforce education programs tailored to nanotechnology pattern generation.
- Program Evaluation: Assists organizations in evaluating existing education programs to ensure coverage of critical nanomanufacturing competencies.
- Industry Relevance: Aligns educational outcomes with current industry needs, improving the job marketability of program participants across nanomanufacturing roles.
- Workforce Flexibility: Helps workers acquire a broad base of knowledge, enabling easier transition between roles within the nanotechnology field.
- Standardization and Compliance: Facilitates consistency in workforce education, supporting alignment with internationally recognized standards and regulatory expectations.
Related Standards
Several other ASTM and ISO standards complement ASTM E3034-20, providing comprehensive guidance on nanotechnology workforce education and definition of terms:
- ASTM E2456: Terminology Relating to Nanotechnology
- ASTM E2996: Guide for Workforce Education in Nanotechnology Health and Safety
- ASTM E3001: Practice for Workforce Education in Nanotechnology Characterization
- ASTM E3089: Guide for Nanotechnology Workforce Education in Material Properties and Effects of Size
- ASTM E2535: Guide for Handling Unbound Engineered Nanoscale Particles in Occupational Settings
- ISO/TS 80004-2: Nanotechnologies - Vocabulary - Part 2: Nano-Objects
- ISO/TS 80004-8: Nanotechnologies - Vocabulary - Part 8: Nanomanufacturing Processes
By implementing ASTM E3034-20, organizations contribute to a well-prepared, adaptable, and safety-conscious nanotechnology workforce, supporting innovation and performance in pattern generation and nanomanufacturing.
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Frequently Asked Questions
ASTM E3034-20 is a guide published by ASTM International. Its full title is "Standard Guide for Workforce Education in Nanotechnology Pattern Generation". This standard covers: SIGNIFICANCE AND USE 5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research. 5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this standard may require a post-secondary two-year science or technology background to be understood sufficiently. 5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of pattern generation methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology field. 5.4 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education. SCOPE 1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in nanoscale pattern definition. 1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers. 1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard. 1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations. 1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
SIGNIFICANCE AND USE 5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum knowledge base for anyone involved in nanomanufacturing or nanomaterials research. 5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this standard may require a post-secondary two-year science or technology background to be understood sufficiently. 5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a complement of pattern generation methods, thus increasing their marketability for jobs within as well as beyond the nanotechnology field. 5.4 This guide is intended to be one in a series of standards developed for workforce education in various aspects of nanotechnology. It will assist in providing an organization a basic structure for developing a program applicable to many areas in nanotechnology, thus providing dynamic and evolving workforce education. SCOPE 1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many areas in nanotechnology research, development, or manufacturing. The individual so educated may be involved in nanoscale pattern definition. 1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field. This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet the needs of their local employers. 1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard. 1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology. It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations. 1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.6 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
ASTM E3034-20 is classified under the following ICS (International Classification for Standards) categories: 07.120 - Nanotechnologies. The ICS classification helps identify the subject area and facilitates finding related standards.
ASTM E3034-20 has the following relationships with other standards: It is inter standard links to ASTM E2456-06. Understanding these relationships helps ensure you are using the most current and applicable version of the standard.
ASTM E3034-20 is available in PDF format for immediate download after purchase. The document can be added to your cart and obtained through the secure checkout process. Digital delivery ensures instant access to the complete standard document.
Standards Content (Sample)
This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the
Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Designation: E3034 − 20
Standard Guide for
Workforce Education in Nanotechnology Pattern
Generation
This standard is issued under the fixed designation E3034; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope mendations issued by the World Trade Organization Technical
Barriers to Trade (TBT) Committee.
1.1 This guide provides a framework for a basic workforce
education in pattern generation topics related to
2. Referenced Documents
nanotechnology, to be taught at an undergraduate college level.
2.1 ASTM Standards:
The education should be broadbased, preparing an individual
E2456 Terminology Relating to Nanotechnology
to work in one of many areas in nanotechnology research,
E2996 Guide for Workforce Education in Nanotechnology
development, or manufacturing. The individual so educated
Health and Safety
may be involved in nanoscale pattern definition.
E3001 Practice for Workforce Education in Nanotechnology
1.2 This guide may be used to develop or evaluate an
Characterization
education program for pattern generation topics in the nano-
E3089 Guide for Nanotechnology Workforce Education in
technology field.This guide provides listings of key topics that
Material Properties and Effects of Size
should be covered in a nanotechnology education program on
2.2 ISO Standards:
this subject, but it does not provide specific course material to
ISO/TS 80004-2 Nanotechnologies – Vocabulary—Part 2:
be used in such a program. This approach is taken in order to
Nano-objects
allow workforce education entities to ensure their programs
ISO/TS 80004-8 Nanotechnologies – Vocabulary—Part 8:
cover the required material while also enabling these institu-
Nanomanufacturing processes
tions to tailor their programs to meet the needs of their local
3. Terminology
employers.
3.1 Definitions:
1.3 While no units of measurements are used in this
3.1.1 For definitions of terms related to nanotechnology in
standard guide, values stated in SI units are to be regarded as
general, refer to Terminology E2456 and ISO/TS 80004-2.
standard.
3.1.2 For definitions of terms related to nanotechnology
1.4 This standard does not purport to address all of the
pattern generation in general, refer to ISO/TS 80004-8.
methods and concepts needed for pattern generation in nano-
3.2 Definitions of Terms Specific to This Standard:
technology. It may not cover knowledge and skill objectives
3.2.1 pattern, n—a design or a layout for fabricated struc-
applicable to local conditions or required by local regulations.
tures.
1.5 This standard does not purport to address all of the
3.2.2 pattern generation, n—the technique(s) to create and
safety concerns, if any, associated with its use. It is the
transferapatternontoamediumasappliedinfabricationatthe
responsibility of the user of this standard to establish appro-
micro- or nanoscale; for example, photolithography is an
priate safety, health, and environmental practices and deter-
optical technique used in chip manufacturing for generating a
mine the applicability of regulatory limitations prior to use.
pattern on a substrate.
1.6 This international standard was developed in accor-
dance with internationally recognized principles on standard-
4. Summary of Guide
ization established in the Decision on Principles for the
4.1 This guide designates a list of six topics on pattern
Development of International Standards, Guides and Recom-
generation relevant to nanotechnology workforce education.
For referenced ASTM standards, visit the ASTM website, www.astm.org, or
This guide is under the jurisdiction of ASTM Committee E56 on Nanotech- contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
nology and is the direct responsibility of Subcommittee E56.07 on Education and Standards volume information, refer to the standard’s Document Summary page on
Workforce Development. the ASTM website.
Current edition approved Sept. 1, 2020. Published October 2020. Originally Available from International Organization for Standardization (ISO), ISO
approved in 2015. Last previous edition approved in 2015 as E3034 – 15. DOI: Central Secretariat, BIBC II, Chemin de Blandonnet 8, CP 401, 1214 Vernier,
10.1520/E3034-20. Geneva, Switzerland, http://www.iso.org.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
E3034 − 20
NOTE 3—See Practice E3001 for details.
Selection of the techniques, concepts, and materials are based
on inputs from industry, nanotechnology educators and subject
7. Concepts and Skills to be Covered
matter experts.
7.1 Relevant methods for workforce education in nanotech-
4.2 In this list, the first topic (8.1) pertains to the design of
nology pattern generation are listed in Section 8, with specific
the patterns. The following five topics cover various lithogra-
important topics to be covered for each method. Additional
phy techniques. Three of the topics (8.2, 8.3, and 8.5) cover
methods or topics, or both, may be added on an as-needed
techniquesrequiringphysicalmaskstogeneratethepatternson
basis.
asubstrate.Theothertwotopics(8.4and8.6)donotutilizeany
physical masks, but use either electronic design files (8.4)or
8. Concepts and Techniques Relevant to Nanotechnology
engineering of the materials (8.6).
Pattern Generation
4.3 Within each of the six topics in the list, important
8.1 Layout Design:
sub-topics recommended to be covered are listed specifically.
8.1.1 Define function.
8.1.2 Design partition.
4.4 This approach provides both a broad education as well
8.1.3 Design simulation.
as in-depth emphasis for key subjects within the time con-
straints of an instructional course or program.
8.2 Optical Lithography:
8.2.1 Optics for Lithography:
5. Significance and Use
8.2.1.1 Diffraction.
5.1 The purpose of this guide is to
...
This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Because
it may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current version
of the standard as published by ASTM is to be considered the official document.
Designation: E3034 − 15 E3034 − 20
Standard Guide for
Workforce Education in Nanotechnology Pattern
Generation
This standard is issued under the fixed designation E3034; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope
1.1 This guide provides a framework for a basic workforce education in pattern generation topics related to nanotechnology, to
be taught at an undergraduate college level. The education should be broadbased, preparing an individual to work in one of many
areas in naotechnologynanotechnology research, development, or manufacturing. The individual so educated may be involved in
nanoscale pattern definition.
1.2 This guide may be used to develop or evaluate an education program for pattern generation topics in the nanotechnology field.
This guide provides listings of key topics that should be covered in a nanotechnology education program on this subject, but it does
not provide specific course material to be used in such a program. This approach is taken in order to allow workforce education
entities to ensure their programs cover the required material while also enabling these institutions to tailor their programs to meet
the needs of their local employers.
1.3 While no units of measurements are used in this standard guide, values stated in SI units are to be regarded as standard.
1.4 This standard does not purport to address all of the methods and concepts needed for pattern generation in nanotechnology.
It may not cover knowledge and skill objectives applicable to local conditions or required by local regulations.
1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility
of the user of this standard to establish appropriate safety safety, health, and healthenvironmental practices and determine the
applicability of regulatory limitations prior to use.
1.6 This international standard was developed in accordance with internationally recognized principles on standardization
established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued
by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents
2.1 ASTM Standards:
E2456 Terminology Relating to Nanotechnology
E2996 Guide for Workforce Education in Nanotechnology Health and Safety
E3001 Practice for Workforce Education in Nanotechnology Characterization
E3089 Guide for Nanotechnology Workforce Education in Material Properties and Effects of Size
This guide is under the jurisdiction of ASTM Committee E56 on Nanotechnology and is the direct responsibility of Subcommittee E56.07 on Education and Workforce
Development.
Current edition approved Oct. 15, 2015Sept. 1, 2020. Published November 2015October 2020. Originally approved in 2015. Last previous edition approved in 2015 as
E3034 – 15. DOI: 10.1520/E3034-15.10.1520/E3034-20.
For referenced ASTM standards, visit the ASTM website, www.astm.org, or contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM Standards
volume information, refer to the standard’s Document Summary page on the ASTM website.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
E3034 − 20
2.2 ISO Standards:
ISO/TS 80004-2 Nanotechnologies – Vocabulary—Part 2: Nano-ObjectsNano-objects
ISO/TS 80004-8 Nanotechnologies – Vocabulary—Part 8: Nanomanufacturing Processesprocesses
3. Terminology
3.1 Definitions:
3.1.1 For definitions of terms related to nanotechnology in general, refer to Terminology E2456 and ISO/TS 80004-2.
3.1.2 For definitions of terms related to nanotechnology pattern generation in general, refer to ISO/TS 80004-8.
3.2 Definitions of Terms Specific to This Standard:
3.2.1 education, n—the teaching of specific topics as part of a degree or certificate program, or as training to provide additional
skills and knowledge.
3.2.1 pattern, n—a design or a layout for fabricated structures.
3.2.2 pattern generation, n—the technique(s) to create and transfer a pattern onto a medium as applied in fabrication at the micro-
or nanoscale; for example, photolithography is an optical technique used in chip manufacturing for generating a pattern on a
substrate.
4. Summary of Guide
4.1 This guide designates a list of six topics on pattern generation relevant to nanotechnology workforce education. Selection of
the techniques, concepts, and materials are based on inputs from industry, nanotechnology educators and subject matter experts.
4.2 In this list, the first topic (8.1) pertains to the design of the patterns. The following five topics cover various lithography
techniques. Three of the topics (8.2, 8.3, and 8.5) cover techniques requiring physical masks to generate the patterns on a substrate.
The other two topics (8.4 and 8.6) do not utilize any physical masks, but use either electronic design files (8.4) or engineering of
the materials (8.6).
4.3 Within each of the six topics in the list, important sub-topics recommended to be covered are listed specifically.
4.4 This approach provides both a broad education as well as in-depth emphasis for key subjects within the time constraints of
an instructional course or program.
5. Significance and Use
5.1 The purpose of this guide is to provide a basic educational structure for pattern generation in nanotechnology to organizations
developing or carrying out education programs for the nanotechnology workforce. This guide helps to describe the minimum
knowledge base for anyone involved in nanomanufacturing or nanomaterials research.
5.2 The basic education should prepare an individual for varied roles in the nanotechnology workplace. The material in this
standard may require a post-secondary two-year science or technology background to be understood sufficiently. Depth on the
topics should be sufficient to transfer between various applications of nanotechnology such as nanomaterial fabrication,
nanomaterial characterization, nanolithography, and patterning.
5.3 Workers may transition in their roles in the workplace. Participants in such education will have a broad understanding of a
complement of pattern generation metho
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