ISO 21859:2019

INTERNATIONAL ISO
STANDARD 21859
First edition
2019-06
Fine ceramics (advanced ceramics,
advanced technical ceramics) — Test
method for plasma resistance of
ceramic components in semiconductor
manufacturing equipment
Céramiques techniques — Méthode d’essai pour déterminer
la résistance au plasma des composants céramiques dans les
équipements de production à semi-conducteurs
Reference number
ISO 21859:2019(E)
©
ISO 2019

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ISO 21859:2019(E)

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Published in Switzerland
ii © ISO 2019 – All rights reserved

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ISO 21859:2019(E)

Contents Page
Foreword .iv
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Principle of measurement . 1
5 Test environment . 2
6 Apparatus . 2
7 Test pieces . 2
7.1 General consideration . 2
7.2 Surface conditions . 2
8 Procedure. 2
8.1 Measurement of surface roughness before a plasma resistance test . 2
8.2 Masking . 3
8.3 Plasma resistance test . 3
8.3.1 Setting of test pieces . 3
8.3.2 Test conditions. 3
8.4 Measurement of erosion depth . 3
8.5 Measurement of surface roughness after the plasma resistance test . 3
9 Calculation .
...