IEC TS 62607-6-7:2023

IEC TS 62607-6-7 ®
Edition 1.0 2023-06
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –
Part 6-7: Graphene – Sheet resistance: van der Pauw method

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IEC TS 62607-6-7 ®
Edition 1.0 2023-06
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –

Part 6-7: Graphene – Sheet resistance: van der Pauw method

INTERNATIONAL
ELECTROTECHNICAL
COMMISSION
ICS  07.120 ISBN 978-2-8322-7114-8

– 2 – IEC TS 62607-6-7:2023  IEC 2023
CONTENTS
FOREWORD . 4
INTRODUCTION . 6
1 Scope . 7
2 Normative references . 7
3 Terms and definitions . 7
3.1 General terms . 8
3.5 Key control characteristics measured in accordance with this standard . 9
3.6 Terms related to the measurement method . 10
4 General . 11
4.1 Measurement principle . 11
4.2 Non-uniform samples . 11
4.3 Sample preparation method . 11
4.4 Description of measurement equipment . 11
4.5 Ambient conditions during measurement . 12
4.6 Related standards . 12
5 Measurement procedure . 13
5.1 Calibration of measurement equipment . 13
5.2 Detailed protocol of the measurement procedure . 13
5.3 Settings and precautions for the measurement of R . 14
ij,kl
5.4 Four-terminal resistance measurement accuracy . 15
6 Data analysis and interpretation of results . 16
6.1 General . 16
6.1.1 Calculation of R . 16
S
6.1.2 Further corrections . 16
6.1.3 Expression of uncertainty on R . 16
S
6.2 One measurement configuration . 17
6.3 Multiple measurement configurations . 18
7 Results to be reported . 18
7.1 Cover sheet . 18
7.2 Sample identification . 18
7.3 Measurement conditions . 18
7.4 Measurement results . 18
Annex A (informative) Effects of ambient conditions on graphene resistance
measurements . 20
A.1 General . 20
A.2 Temperature (T) . 20
A.3 Relative humidity (RH) . 20
Annex B (informative) Experimental example . 21
B.1 Sample . 21
B.2 Ambient conditions. 21
B.3 Instrumentation . 21
B.4 Sampling plan . 22
B.5 Measurement procedure . 23
B.6 Results . 23

Annex C (informative) Other standards related to the measurement of sheet
resistance . 25
Bibliography . 26

Figure 1 – Schematic view of a van der Pauw measurement setup, and a detail of

typical spring-mounted probe . 12
Figure 2 – Schematic view of a typical vdP measurement setup and measurement
sequence . 14
Figure 3 – Schematic representation of a possible sampling plan representation for the
vdP method . 19
Figure B.1 – CVD graphene on quartz . 21
Figure B.2 – Schematic lateral view of the multi-terminal fixture . 22
Figure B.3 – Sampling plan used for the present example . 22

Table 1 – Example of measurable values for R , and the corresponding measurement
S
settings and type-B uncertainty, when using a current source Keithley 2602B System
SourceMeter® and a HP 34420 Nano Volt / Micro Ohm Meter (1y calibration
specifications) . 15
Table B.1 – Measured values for R (p) and R (p) using a current source
AB,CD BC,DA
Keithley 2602B and a voltmeter HP 34461 (1y stability specifications) . 23
Table B.2 – Measured values for R (p) and corresponding uncertainty values using a
S
current source Keithley 2602B and a voltmeter HP 34461 (1y stability specifications) . 23
Table B.3 – Summary of the uncertainty contributions to R . 24
S
– 4 – IEC TS 62607-6-7:2023  IEC 2023
INTERNATIONAL ELECTROTECHNICAL COMMISSION
____________
NANOMANUFACTURING –
KEY CONTROL CHARACTERISTICS –
Part 6-7: Graphene – Sheet resistance: van der Pauw method

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IEC TS 62607-6-7
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