ASTM E2244-11e1

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
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Designation:E2244 −11
Standard Test Method for
In-Plane Length Measurements of Thin, Reflecting Films
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Using an Optical Interferometer
This standard is issued under the fixed designation E2244; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision.Anumber in parentheses indicates the year of last reapproval.A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
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ε NOTE—Reference (1) was editorially revised in September 2013.
1. Scope 2. Referenced Documents
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1.1 This test method covers a procedure for measuring 2.1 ASTM Standards:
E2245Test Method for Residual Strain Measurements of
in-plane lengths (including deflections) of patterned thin films.
It applies only to films, such as found in microelectromechani- Thin, Reflecting Films Using an Optical Interferometer
E2246Test Method for Strain Gradient Measurements of
cal systems (MEMS) materials, which can be imaged using an
optical interferometer, also called an interferometric micro- Thin, Reflecting Films Using an Optical Interferometer
E2444Terminology Relating to Measurements Taken on
scope.
Thin, Reflecting Films
1.2 There are other ways to determine in-plane lengths.
E2530Practice for Calibrating the Z-Magnification of an
Using the design dimensions typically provides more precise
Atomic Force Microscope at Subnanometer Displacement
in-plane length values than using measurements taken with an
Levels Using Si(111) Monatomic Steps (Withdrawn
optical interferometric microscope. (Interferometric measure-
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2015)
mentsaretypicallymoreprecisethanmeasurementstakenwith
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2.2 SEMI Standard:
an optical microscope.) This test method is intended for use
MS2Test Method for Step Height Measurements of Thin
when interferometric measurements are preferred over using
Films
the design dimensions (for example, when measuring in-plane
deflections and when measuring lengths in an unproven fabri-
3. Terminology
cation process).
3.1 Definitions:
1.3 This test method uses a non-contact optical interfero-
3.1.1 The following terms can be found in Terminology
metricmicroscopewiththecapabilityofobtainingtopographi-
E2444.
cal 3-D data sets. It is performed in the laboratory.
3.1.2 2-D data trace, n—a two-dimensional group of points
that is extracted from a topographical 3-D data set and that is
1.4 The maximum in-plane length measured is determined
parallel to the xz-or yz-plane of the interferometric micro-
by the maximum field of view of the interferometric micro-
scope.
scope at the lowest magnification. The minimum deflection
measured is determined by the interferometric microscope’s 3.1.3 3-D data set, n—a three-dimensional group of points
pixel-to-pixel spacing at the highest magnification.
with a topographical z-value for each (x, y) pixel location
within the interferometric microscope’s field of view.
1.5 This standard does not purport to address all of the
safety concerns, if any, associated with its use. It is the 3.1.4 anchor, n—in a surface-micromachining process, the
responsibility of the user of this standard to establish appro- portion of the test structure where a structural layer is inten-
priate safety and health practices and determine the applica- tionally attached to its underlying layer.
bility of regulatory limitations prior to use.
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For referenced ASTM standards, visit the ASTM website, www.astm.org, or
contact ASTM Customer Service at service@astm.org. For Annual Book of ASTM
Standards volume information, refer to the standard’s Document Summary page on
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This test method is under the jurisdiction ofASTM Committee E08 on Fatigue the ASTM website.
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and Fracture and is the direct responsibility of Subcommittee E08.05 on Cyclic The last approved version of this historical standard is referenced on
Deformation and Fatigue Crack Formation. www.astm.org.
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Current edition approved Nov. 1, 2011. Published December 2011. Originally For referenced Semiconductor Equipment and Materials International (SEMI)
approved in 2002. Last previous edition approved in 2005 as E2244–05. standards, visit the SEMI website, www.semi.org.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
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E2244−11
3.1.5 anchor lip, n—in a surface-micromachining process, 3.2.1 For Calibration:
the freestanding extension of the structural layer of interest σ =the standard deviation in a ruler measurement in the
xcal
around the edges of the anchor to its underlying layer. interferometric microscope’s x-direction for the given combi-
3.1.5.1 Discussion—In some processes, the width of the nation of lenses
anchor lip may be zero. σ =the standard deviation in a ruler measurement in the
ycal
interf
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