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ASTM F1845-97

(Test Method)

Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer

Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer

SCOPE
1.1 This test method determines the concentrations of trace metallic impurities in high purity (99.99 wt. % pure, or purer, with respect to metallic trace impurities) aluminum-copper, aluminum-silicon and aluminum-copper-silicon alloys with major alloy constituents as follows:
aluminum---Greater than 95.0%  copper---Less or equal than 5.0%  silicon---Less or equal than 5.0%
1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS).
1.3 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment, skillfully used by an experienced operator, is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparations, setting of relative sensitivity factors, determination of detection limits, etc.) known by the responsible technical committee to effect the reliability of high purity aluminum analyses.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

General Information

Status
Historical
Publication Date
09-Dec-1997
Technical Committee
F01 - Electronics
Drafting Committee
F01.17 - Sputter Metallization
Current Stage
Ref Project

Relations

Replaced By
ASTM F1845-97(2002) - Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer
Effective Date
10-Dec-2002

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ASTM F1845-97 - Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass SpectrometerASTM F1845-97 - Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer
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ASTM F1845-97 - Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer
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Standards Content (Sample)

NOTICE: This standard has either been superseded and replaced by a new version or withdrawn. Contact
ASTM International (www.astm.org) for the latest information.
Designation: F 1845 – 97
AMERICAN SOCIETY FOR TESTING AND MATERIALS
100 Barr Harbor Dr., West Conshohocken, PA 19428
Reprinted from the Annual Book of ASTM Standards. Copyright ASTM
Standard Test Method for
Trace Metallic Impurities in Electronic Grade Aluminum-
Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon
Alloys by High-Mass-Resolution Glow Discharge Mass
1
Spectrometer
This standard is issued under the fixed designation F 1845; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope F 1593 Test Method for Trace Metallic Impurities in Elec-
tronic Grade Aluminum by High-Mass-Resolution Glow
1.1 This test method determines the concentrations of trace
5
Discharge Mass Spectrometer
metallic impurities in high purity (99.99 wt. % pure, or purer,
F 1594 Specification for Pure Aluminum (Unalloyed)
with respect to metallic trace impurities) aluminum-copper,
5
Source Material for Vacuum Coating Applications
aluminum-silicon and aluminum-copper-silicon alloys with
major alloy constituents as follows:
3. Terminology
aluminum Greater than 95.0 %
3.1 Terminology in this test method is consistent with
copper Less or equal than 5.0 %
silicon Less or equal than 5.0 %
Terminology E 135. Required terminology specific to this test
method, not covered in Terminology E 135, is indicated in 3.2.
1.2 This test method pertains to analysis by magnetic-sector
3.2 Definitions:
glow discharge mass spectrometer (GDMS).
3.2.1 campaign—a test procedure to determine the accuracy
1.3 This test method does not include all the information
of the instrument, which was normally performed at the
needed to complete GDMS analyses. Sophisticated computer-
beginning of the day or after the instrument modification, or
controlled laboratory equipment, skillfully used by an experi-
both.
enced operator, is required to achieve the required sensitivity.
3.2.2 reference sample—material accepted as suitable for
This test method does cover the particular factors (for example,
use as a calibration/sensitivity reference standard by all parties
specimen preparation, setting of relative sensitivity factors,
concerned with the analyses.
determination of detection limits, etc.) known by the respon-
3.2.3 specimen—a suitably sized piece cut from a reference
sible technical committee to effect the reliability of high purity
or test sample, prepared for installation in the GDMS ion
aluminum analyses.
source, and analyzed.
1.4 This standard does not purport to address all of the
3.2.4 test sample—material (aluminum alloy) to be ana-
safety concerns, if any, associated with its use. It is the
lyzed for trace metallic impurities by this GDMS method.
responsibility of the user of this standard to establish appro-
3.2.4.1 Discussion—Generally the test sample is extracted
priate safety and health practices and determine the applica-
from a larger batch (lot, casting) of product and is intended to
bility of regulatory limitations prior to use.
be representative of the batch.
2. Referenced Documents
4. Summary of Test Method
2.1 ASTM Standards:
E 135 Terminology Relating to Analytical Chemistry for
4.1 A specimen is mounted in a plasma discharge cell.
2
Metals, Ores, and Related Materials Atoms subsequently sputtered from the specimen surface are
E 180 Practice for Determining the Precision of ASTM
ionized, and then focused as an ion beam through a double-
3
Methods for Analysis and Testing of Industrial Chemicals focusing magnetic-sector mass separation apparatus. The mass
4
E 673 Terminology Relating to Surface Analysis
spectrum (the ion current) is collected as magnetic field or
E 876 Practice for Use of Statistics in the Evaluation of acceleration voltage, (or both) is scanned.
4
Spectrometric Data
4.2 The ion current of an isotope at mass M is the total
i
measured current, less contributions from all other interfering
1 sources. Portions of the measured current may originate from
This test method is under the jurisdiction of ASTM Committee F-1 on
the ion detector alone (detector noise). Portions may be due to
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputtered
Thin Films.
incompletely mass resolved ions of an isotope or molecule with
Current edition approved December 10, 1997. Published April 1998.
2
Annual Book of ASTM Standards, Vol 03.05.
3
Annual Book of ASTM Standards, Vol 15.05.
4 5
Annual Book of ASTM Standards, Vol 03.06. Annual Book of ASTM Standards, Vol 10.04.
1

---------------------- Page: 1 ----------------------
NOTICE:¬This¬standard¬has¬either¬been¬superceded¬and¬replaced¬by¬a¬new¬version¬or¬discontinue
...

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