FprEN IEC 60749-26:2025
(Main)Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic discharge (ESD) sensitivity testing - Human body model (HBM)
Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic discharge (ESD) sensitivity testing - Human body model (HBM)
IEC 60749-26:2025 establishes the procedure for testing, evaluating, and classifying components and microcircuits in accordance with their susceptibility (sensitivity) to damage or degradation by exposure to a defined human body model (HBM) electrostatic discharge (ESD). The purpose of this document is to establish a test method that will replicate HBM failures and provide reliable, repeatable HBM ESD test results from tester to tester, regardless of component type. Repeatable data will allow accurate classifications and comparisons of HBM ESD sensitivity levels. ESD testing of semiconductor devices is selected from this test method, the machine model (MM) test method (see IEC 60749‑27) or other ESD test methods in the IEC 60749 series. Unless otherwise specified, this test method is the one selected. This edition includes the following significant technical changes with respect to the previous edition: a) new definitions have been added; b) text has been added to clarify the designation of and allowances resulting from “low parasitics”. The new designation includes the maximum number of pins of a device that can pass the test procedure.
Halbleiterbauelemente - Mechanische und klimatische Prüfverfahren - Teil 26: Prüfung der Empfindlichkeit gegen elektrostatische Entladungen (ESD) - Human Body Model (HBM)
Dispositifs à semiconducteurs - Méthodes d'essais mécaniques et climatiques - Partie 26: Essai de sensibilité aux décharges électrostatiques (DES) - Modèle du corps humain (HBM)
L’IEC 60749-26:2025 établit une procédure pour les essais, l’évaluation et la classification des composants et des microcircuits en fonction de leur susceptibilité (sensibilité) aux dommages ou de leur dégradation à la suite de leur exposition à des décharges électrostatiques (DES) sur un modèle de corps humain (HBM) défini. Le but du présent document est de déterminer une méthode d’essai permettant de reproduire les défaillances du HBM et de fournir des résultats d’essais de DES de HBM fiables et reproductibles d’un appareil d’essai à un autre, sans tenir compte du type de composant. Les données répétables permettent d’établir des classifications et des comparaisons précises des niveaux de sensibilité aux décharges électrostatiques des HBM. Les essais de DES dispositifs à semiconducteurs sont choisis entre la présente méthode d’essai, celle du modèle de machine (MM) (voir l’IEC 60749‑27) ou toute autre méthode d’essai de la série IEC 60749. Sauf indication contraire, la présente méthode d’essai est celle qui prévaut. Cette édition inclut les modifications techniques majeures suivantes par rapport à l’édition précédente: a) de nouvelles définitions ont été ajoutées; b) du texte a été ajouté pour clarifier la désignation de "faibles parasites" et les tolérances qui en découlent. La nouvelle désignation inclut le nombre maximal de broches d’un dispositif qui peut satisfaire à la procédure d’essai.
Polprevodniški elementi - Metode za mehansko in klimatsko preskušanje - 26. del: Preskušanje občutljivosti na elektrostatično razelektritev (ESD) - Model človeškega telesa (HBM)
General Information
Relations
Overview
The FprEN IEC 60749-26:2025 standard, titled "Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic discharge (ESD) sensitivity testing - Human body model (HBM)", sets the globally recognized procedure for evaluating semiconductor devices' susceptibility to electrostatic discharge. Developed by the CLC under IEC TC 47, this standard ensures reliable, repeatable testing and classification of components and microcircuits for ESD damage using the Human Body Model (HBM).
The document establishes a repeatable HBM test method that accurately replicates ESD failures representative of real-world conditions affecting human-handled electronic devices. It supports consistent, universal ESD sensitivity comparisons across different test units and semiconductor types. This latest edition introduces new definitions and clarifies allowances for "low parasitic" simulators, improving test precision and component classification.
Key Topics
- HBM Test Procedure: Defines the standardized testing process using HBM simulators to expose semiconductor devices to controlled electrostatic discharge pulses.
- Test Equipment Qualification: Details mandatory equipment and apparatus requirements including waveform verification tools, oscilloscopes, current probes, and evaluation loads.
- Parasitic Effects: Introduces classification and management of parasitic capacitances within test equipment to ensure waveform integrity and reproducibility.
- Device Stressing Methods: Specifies pin combinations and stressing sequences for comprehensive device classification, covering supply, non-supply, and no-connect pins.
- Waveform Characteristics: Sets precise specifications for HBM discharge waveforms, focusing on peak current, rise time, and pulse duration to replicate typical human body ESD events.
- Failure Criteria and Classification Levels: Defines failure detection methods post-stressing and categorization systems for semiconductor ESD protection sensitivity.
- Routine Verification: Emphasizes ongoing equipment and waveform checks to maintain test consistency, enhancing data accuracy across devices and laboratories.
- Informative Annexes: Provides supplementary detailed guidance on cloned pin sampling, parasitic testing, failure window detection, and flow charts outlining the entire test protocol.
Applications
The FprEN IEC 60749-26:2025 standard is vital for manufacturers, test labs, and designers involved in semiconductor device production and quality assurance. Its practical applications include:
- Quality Control: Ensures semiconductor components meet stringent ESD tolerance requirements, reducing failure risks in end-use electronics.
- Product Classification: Facilitates categorizing device ESD sensitivity, aiding the design of ESD-protective measures in integrated circuits.
- Design Validation: Allows engineers to validate the robustness of semiconductor designs against human body electrostatic discharge events.
- Compliance Testing: Provides the benchmark procedure for compliance with international ESD sensitivity norms in semiconductor manufacturing.
- Reliability Improvement: Helps identify vulnerabilities to ESD damage, enabling corrective engineering interventions to enhance device durability.
- Test Equipment Calibration: Guides the qualification and periodic verification of ESD simulators and measurement apparatus to ensure test result integrity.
Related Standards
This part of the IEC 60749 series complements other electrostatic discharge test methods, specifically:
- IEC 60749-27: Covers the Machine Model (MM) ESD sensitivity testing method, providing alternative stress conditions representing automated equipment discharge.
- IEC 60749 series: Encompasses broader mechanical and climatic test methods for semiconductor devices, including thermal, vibration, and environmental stress testing.
- IEC 61000-4-2: Specifies general ESD immunity testing applied to electronic equipment, supporting system-level ESD robustness assessments.
Adherence to FprEN IEC 60749-26:2025 ensures proactive ESD sensitivity management aligned with global semiconductor quality standards, enhancing device reliability and safety in consumer, industrial, and automotive electronics worldwide.
Frequently Asked Questions
FprEN IEC 60749-26:2025 is a draft published by CLC. Its full title is "Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic discharge (ESD) sensitivity testing - Human body model (HBM)". This standard covers: IEC 60749-26:2025 establishes the procedure for testing, evaluating, and classifying components and microcircuits in accordance with their susceptibility (sensitivity) to damage or degradation by exposure to a defined human body model (HBM) electrostatic discharge (ESD). The purpose of this document is to establish a test method that will replicate HBM failures and provide reliable, repeatable HBM ESD test results from tester to tester, regardless of component type. Repeatable data will allow accurate classifications and comparisons of HBM ESD sensitivity levels. ESD testing of semiconductor devices is selected from this test method, the machine model (MM) test method (see IEC 60749‑27) or other ESD test methods in the IEC 60749 series. Unless otherwise specified, this test method is the one selected. This edition includes the following significant technical changes with respect to the previous edition: a) new definitions have been added; b) text has been added to clarify the designation of and allowances resulting from “low parasitics”. The new designation includes the maximum number of pins of a device that can pass the test procedure.
IEC 60749-26:2025 establishes the procedure for testing, evaluating, and classifying components and microcircuits in accordance with their susceptibility (sensitivity) to damage or degradation by exposure to a defined human body model (HBM) electrostatic discharge (ESD). The purpose of this document is to establish a test method that will replicate HBM failures and provide reliable, repeatable HBM ESD test results from tester to tester, regardless of component type. Repeatable data will allow accurate classifications and comparisons of HBM ESD sensitivity levels. ESD testing of semiconductor devices is selected from this test method, the machine model (MM) test method (see IEC 60749‑27) or other ESD test methods in the IEC 60749 series. Unless otherwise specified, this test method is the one selected. This edition includes the following significant technical changes with respect to the previous edition: a) new definitions have been added; b) text has been added to clarify the designation of and allowances resulting from “low parasitics”. The new designation includes the maximum number of pins of a device that can pass the test procedure.
FprEN IEC 60749-26:2025 is classified under the following ICS (International Classification for Standards) categories: 31.080.01 - Semiconductor devices in general. The ICS classification helps identify the subject area and facilitates finding related standards.
FprEN IEC 60749-26:2025 has the following relationships with other standards: It is inter standard links to EN IEC 60749-26:2018. Understanding these relationships helps ensure you are using the most current and applicable version of the standard.
You can purchase FprEN IEC 60749-26:2025 directly from iTeh Standards. The document is available in PDF format and is delivered instantly after payment. Add the standard to your cart and complete the secure checkout process. iTeh Standards is an authorized distributor of CLC standards.
Standards Content (Sample)
SLOVENSKI STANDARD
oSIST prEN IEC 60749-26:2025
01-januar-2025
Polprevodniški elementi - Metode za mehansko in klimatsko preskušanje - 26. del:
Preskušanje občutljivosti na elektrostatično razelektritev (ESD) - Model
človeškega telesa (HBM)
Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic
discharge (ESD) sensitivity testing - Human body model (HBM)
Halbleiterbauelemente - Mechanische und klimatische Prüfverfahren - Teil 26: Prüfung
der Empfindlichkeit gegen elektrostatische Entladungen (ESD) - Human Body Model
(HBM)
Dispositifs à semiconducteurs - Méthodes d'essais mécaniques et climatiques - Partie
26: Essai de sensibilité aux décharges électrostatiques (DES) - Modèle du corps humain
(HBM)
Ta slovenski standard je istoveten z: prEN IEC 60749-26:2024
ICS:
31.080.01 Polprevodniški elementi Semiconductor devices in
(naprave) na splošno general
oSIST prEN IEC 60749-26:2025 en
2003-01.Slovenski inštitut za standardizacijo. Razmnoževanje celote ali delov tega standarda ni dovoljeno.
oSIST prEN IEC 60749-26:2025
oSIST prEN IEC 60749-26:2025
47/2882/CDV
COMMITTEE DRAFT FOR VOTE (CDV)
PROJECT NUMBER:
IEC 60749-26 ED5
DATE OF CIRCULATION: CLOSING DATE FOR VOTING:
2024-11-29 2025-02-21
SUPERSEDES DOCUMENTS:
47/2872/RR
IEC TC 47 : SEMICONDUCTOR DEVICES
SECRETARIAT: SECRETARY:
Korea, Republic of Mr Cheolung Cha
OF INTEREST TO THE FOLLOWING COMMITTEES: HORIZONTAL FUNCTION(S):
ASPECTS CONCERNED:
SUBMITTED FOR CENELEC PARALLEL VOTING NOT SUBMITTED FOR CENELEC PARALLEL VOTING
Attention IEC-CENELEC parallel voting
The attention of IEC National Committees, members of
CENELEC, is drawn to the fact that this Committee Draft
for Vote (CDV) is submitted for parallel voting.
The CENELEC members are invited to vote through the
CENELEC online voting system.
This document is still under study and subject to change. It should not be used for reference purposes.
Recipients of this document are invited to submit, with their comments, notification of any relevant patent rights of
which they are aware and to provide supporting documentation.
Recipients of this document are invited to submit, with their comments, notification of any relevant “In Some
Countries” clauses to be included should this proposal proceed. Recipients are reminded that the CDV stage is the
final stage for submitting ISC clauses. (SEE AC/22/2007 OR NEW GUIDANCE DOC).
TITLE:
Semiconductor devices - Mechanical and climatic test methods - Part 26: Electrostatic
discharge (ESD) sensitivity testing - Human body model (HBM)
PROPOSED STABILITY DATE: 2029
NOTE FROM TC/SC OFFICERS:
download this electronic file, to make a copy and to print out the content for the sole purpose of preparing National
Committee positions. You may not copy or "mirror" the file or printed version of the document, or any part of it, for
any other purpose without permission in writing from IEC.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 2 – 47/2882/CDV
1 CONTENTS
2 FOREWORD . 5
3 1. Scope . 7
4 2. Normative references . 7
5 3. Terms and definitions . 7
6 4. Apparatus and required equipment . 11
7 4.1. Waveform verification equipment . 11
8 4.2. Oscilloscope . 11
9 4.3. Additional requirements for digital oscilloscopes . 12
10 4.4. Current probe . 12
11 4.5. Evaluation loads . 12
12 4.6. Attenuator . 12
13 4.7. Human body model simulator . 12
14 4.8. HBM test equipment parasitic properties . 13
15 5. Stress test equipment qualification and routine verification . 13
16 5.1. Overview of required HBM tester evaluations . 13
17 5.2. Measurement procedures . 14
18 5.2.1. Reference pin pair determination . 14
19 5.2.2. Waveform capture with current probe . 14
20 5.2.3. Determination of waveform parameters . 15
21 5.2.4. High voltage discharge path test . 18
22 5.3. HBM tester qualification . 18
23 5.3.1. HBM ESD tester qualification requirements . 18
24 5.3.2. HBM tester qualification procedure . 18
25 5.4. Test fixture board qualification for socketed testers . 19
26 5.5. Routine waveform check requirements . 20
27 5.5.1. Standard routine waveform check description . 20
28 5.5.2. Waveform check frequency . 20
29 5.5.3. Alternate routine waveform capture procedure . 21
30 5.6. High voltage discharge path check . 21
31 5.6.1. Relay testers . 21
32 5.6.2. Non-relay testers . 21
33 5.7. Tester waveform records. 21
34 5.7.1. Tester and test fixture board qualification records . 21
35 5.7.2. Periodic waveform check records . 21
36 5.8. Safety . 22
37 5.8.1. Initial set-up . 22
38 5.8.2. Training . 22
39 5.8.3. Personnel safety . 22
40 6. Classification procedure . 22
41 6.1. Devices for classification . 22
42 6.2. Parametric and functional testing . 22
43 6.3. Device stressing . 22
44 6.3.1. Device stressing methods . 22
45 6.3.2. No connect pins . 23
46 6.4. Pin combination stressing . 23
47 6.4.1. Pin combination stressing options . 23
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 3 – 47/2882/CDV
48 6.4.2. ‘No-Connect’ Pins . 24
49 6.4.3. Supply pins . 24
50 6.4.4. Non-supply pins . 25
51 6.5. Pin groupings . 25
52 6.5.1. Supply pin groups . 25
53 6.6. Pin stress combinations . 26
54 6.6.1. Pin stress combination categorization . 26
55 6.6.2. Non-supply and supply to supply combinations (1, 2, … N) . 28
56 6.6.3. Non-supply to non-supply combinations . 29
57 6.7. Pin-pair stressing . 29
58 6.8. Low-Parasitic HBM Simulator Allowance . 29
59 6.9. Testing after stressing . 30
60 7. Failure criteria . 30
61 8. Component classification . 30
62 Annex A (informative) Cloned non-supply (I/O) pin sampling test method . 31
63 A.1 Purpose and overview . 31
64 A.2 Pin sampling overview and statistical details . 31
65 A.3 IC product selections . 32
66 A.4 Randomly selecting and testing cloned I/O pins . 33
67 A.5 Determining if sampling can be used with the supplied Excel spreadsheet . 33
68 A.5.1 Using the supplied Excel spreadsheet . 33
69 A.5.2 Without using the Excel spreadsheet . 33
70 A.6 HBM testing with a sample of cloned I/O pins . 34
71 A.7 Examples of testing with sampled cloned I/Os . 34
72 Annex B (informative) Determination of withstand thresholds for pin or pin-combination
73 subsets . 37
74 B.1 Introduction . 37
75 B.2 Testing procedures . 37
76 B.3 Restrictions . 38
77 B.4 Example of using subset withstand threshold data . 38
78 Annex C (informative) HBM test equipment parasitic properties . 39
79 C.1 Optional trailing pulse detection equipment / apparatus . 39
80 C.2 Optional pre-pulse voltage rise detection test equipment . 40
81 C.3 Optional Pre-HBM Current Spike Detection Equipment . 42
82 C.4 Open-relay tester capacitance parasitics . 43
83 C.5 Test to determine if an HBM simulator is a low-parasitic simulator . 44
84 Annex D (informative) HBM test method flow chart . 46
85 Annex E (informative) Failure window detection testing methods . 49
86 E.1 Methodology . 49
87 E.2 Combined Withstand Threshold Method and Window Search . 49
88 E.3 Failure Window Detection with a Known Withstand Threshold . 49
89 Bibliography . 51
91 Figure 1 – Simplified HBM simulator circuit with loads . 13
92 Figure 2 – Current waveform through shorting wires . 16
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 4 – 47/2882/CDV
93 Figure 3 – Current waveform through a 500 resistor . 17
94 Figure 4 – Peak current short circuit ringing waveform . 18
95 Figure A.1 – SPL, V1, VM, and z with the Bell shape distribution pin failure curve . 32
96 Figure A.2 – I/O sampling test method flow chart . 36
97 Figure C.1 – Diagram of trailing pulse measurement setup . 39
98 Figure C.2 – Positive stress at 4 000 V . 40
99 Figure C.3 – Negative stress at 4 000 V . 40
100 Figure C.4 – Illustration of measuring voltage before HBM pulse with a Zener diode or
101 a device . 41
102 Figure C.5 – Example of voltage rise before the HBM current pulse across a 9,4 V
103 Zener diode . 41
104 Figure C.6 – Optional Pre-Current Pulse Detection Equipment/Apparatus . 42
105 Figure C.7 – Positive Stress at 1000 V . 43
106 Figure C.8 – Diagram of a 10-pin shorting test device showing current probe . 45
107 Figure D.1 – HBM test method flow chart (1 of 3, HBM Classification Procedure). 46
109 Table 1 – Waveform specification . 20
110 Table 2 – Preferred pin combinations sets . 27
111 Table 3 – Alternative pin combinations sets . 27
112 Table 4 – HBM ESD component classification levels . 30
113 Table.B.1. Inclusion of Lower ESD Level High-Speed Pin Data ESD Information for
114 Handling of ESDS in an ESD Protected Area (Required) . 38
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 5 – 47/2882/CDV
117 INTERNATIONAL ELECTROTECHNICAL COMMISSION
118 ____________
120 SEMICONDUCTOR DEVICES –
121 MECHANICAL AND CLIMATIC TEST METHODS –
123 Part 26: Electrostatic discharge (ESD) sensitivity testing –
124 Human body model (HBM)
126 FOREWORD
127 1) The International Electrotechnical Commission (IEC) is a worldwide organization for standardization comprising
128 all national electrotechnical committees (IEC National Committees). The object of IEC is to promote international
129 co-operation on all questions concerning standardization in the electrical and electronic fields. To this end and
130 in addition to other activities, IEC publishes International Standards, Technical Specifications, Technical Reports,
131 Publicly Available Specifications (PAS) and Guides (hereafter referred to as “IEC Publication(s)”). Their
132 preparation is entrusted to technical committees; any IEC National Committee interested in the subject dealt with
133 may participate in this preparatory work. International, governmental and non-governmental organizations liaising
134 with the IEC also participate in this preparation. IEC collaborates closely with the International Organization for
135 Standardization (ISO) in accordance with conditions determined by agreement between the two organizations.
136 2) The formal decisions or agreements of IEC on technical matters express, as nearly as possible, an international
137 consensus of opinion on the relevant subjects since each technical committee has representation from all
138 interested IEC National Committees.
139 3) IEC Publications have the form of recommendations for international use and are accepted by IEC National
140 Committees in that sense. While all reasonable efforts are made to ensure that the technical content of IEC
141 Publications is accurate, IEC cannot be held responsible for the way in which they are used or for any
142 misinterpretation by any end user.
143 4) In order to promote international uniformity, IEC National Committees undertake to apply IEC Publications
144 transparently to the maximum extent possible in their national and regional publications. Any divergence between
145 any IEC Publication and the corresponding national or regional publication shall be clearly indicated in the latter.
146 5) IEC itself does not provide any attestation of conformity. Independent certification bodies provide conformity
147 assessment services and, in some areas, access to IEC marks of conformity. IEC is not responsible for any
148 services carried out by independent certification bodies.
149 6) All users should ensure that they have the latest edition of this publication.
150 7) No liability shall attach to IEC or its directors, employees, servants or agents including individual experts and
151 members of its technical committees and IEC National Committees for any personal injury, property damage or
152 other damage of any nature whatsoever, whether direct or indirect, or for costs (including legal fees) and
153 expenses arising out of the publication, use of, or reliance upon, this IEC Publication or any other IEC Publications.
154 8) Attention is drawn to the Normative references cited in this publication. Use of the referenced publications is
155 indispensable for the correct application of this publication.
156 9) Attention is drawn to the possibility that some of the elements of this IEC Publication may be the subject of patent
157 rights. IEC shall not be held responsible for identifying any or all such patent rights.
158 International Standard IEC 60749-26 has been prepared by IEC technical committee 47:
159 Semiconductor devices in collaboration with technical committee 101: Electrostatics.
160 This fifth edition cancels and replaces the fourth edition published in 2018. This edition
161 constitutes a technical revision. This standard is based upon ANSI/ESDA/JEDEC JS-001-2023.
162 It is used with permission of the copyright holders, ESD Association and JEDEC Solid state
163 Technology Association.
164 This edition includes the following significant technical changes with respect to the previous
165 edition:
166 a) new definitions have been added
167 b) text has been added to clarify the designation of and allowances resulting from “low
168 parasitics”. The new designation includes the maximum number of pins of a device that can
169 pass the test procedure.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 6 – 47/2882/CDV
171 The text of this International Standard is based on the following documents:
FDIS Report on voting
47/xxxx/FDIS 47/yyyy/RVD
173 Full information on the voting for the approval of this International Standard can be found in the
174 report on voting indicated in the above table.
175 The language used for the development of this International Standard is English.
176 This document has been drafted in accordance with the ISO/IEC Directives, Part 2, and
177 developed in accordance with ISO/IEC Directives, Part 1 and ISO/IEC Directives, IEC
178 Supplement, available at www.iec.ch/members_experts/refdocs. The main document types
179 developed by IEC are described in greater detail at www.iec.ch/publications.
181 A list of all parts in the IEC 60749 series, published under the general title Semiconductor
182 devices – Mechanical and climatic test methods, can be found on the IEC website.
183 The committee has decided that the contents of this document will remain unchanged until the
184 stability date indicated on the IEC website under "http://webstore.iec.ch" in the data related to
185 the specific document. At this date, the document will be
186 • reconfirmed,
187 • withdrawn,
188 • replaced by a revised edition, or
189 • amended.
IMPORTANT – The 'colour inside' logo on the cover page of this publication indicates
that it contains colours which are considered to be useful for the correct understanding
of its contents. Users should therefore print this document using a colour printer.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 7 – 47/2882/CDV
193 SEMICONDUCTOR DEVICES –
194 MECHANICAL AND CLIMATIC TEST METHODS –
196 Part 26: Electrostatic discharge (ESD) sensitivity testing –
197 Human body model (HBM)
201 1. Scope
202 This part of IEC 60749 establishes the procedure for testing, evaluating, and classifying
203 components and microcircuits according to their susceptibility (sensitivity) to damage or
204 degradation by exposure to a defined human body model (HBM) electrostatic discharge (ESD).
205 The purpose of this document is to establish a test method that will replicate HBM failures and
206 provide reliable, repeatable HBM ESD test results from tester to tester, regardless of component
207 type. Repeatable data will allow accurate classifications and comparisons of HBM ESD
208 sensitivity levels.
209 ESD testing of semiconductor devices is selected from this test method, the machine model
210 (MM) test method (see IEC 60749-27) or other ESD test methods in the IEC 60749 series.
211 Unless otherwise specified, this test method is the one selected.
212 2. Normative references
213 The following documents are referred to in the text in such a way that some or all of their content
214 constitutes requirements of this document. For dated references, only the edition cited applies.
215 For undated references, the latest edition of the referenced document (including any
216 amendments) applies.
217 IEC 60749-28, Semiconductor devices – Mechanical and climatic test methods – Part 28:
218 Electrostatic discharge (ESD) sensitivity testing – Machine model (MM)
219 3. Terms and definitions
220 For the purposes of this document, the following terms and definitions apply.
221 ISO and IEC maintain terminological databases for use in standardization at the following
222 addresses:
223 • IEC Electropedia: available at http://www.electropedia.org/
224 • ISO Online browsing platform: available at http://www.iso.org/obp
225 3.1.
226 above-passivation layer
227 APL
229 A low-impedance metal plane built on the surface of a die, above the passivation layer, which
230 connects a group of bumps or pins (typically power or ground).
231 Note 1 to entry This structure is sometimes referred to as a redistribution layer (RDL). There may be multiple APLs
232 (sometimes referred to as Islands) for a power or ground group.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 8 – 47/2882/CDV
236 3.2.
237 associated non-supply pin
238 non-supply pin (typically an I/O pin) associated with a supply pin group
239 Note 1 to entry A non-supply pin is considered to be associated with a supply pin group if either:
240 a) the current from the supply pin group (i.e., VDDIO) is required for the function of the electrical circuit(s)
241 (I/O driver) that connect(s) (high/low impedance) to that non-supply pin;
242 b) a parasitic path exists between non-supply and supply pin group (e.g., open-drain type non-supply pin to a VCC
243 supply pin group that connects to a nearby N-well guard ring).
244 3.3.
245 cloned non-supply (I/O) pin
246 set of input, output or bidirectional pins using the same I/O cell and electrical schematic and
247 sharing the same associated supply pin group(s) including ESD power clamp(s)
248 3.4.
249 component
250 item such as a resistor, diode, transistor, integrated circuit or hybrid circuit
251 3.5.
252 component failure
253 condition in which a tested component does not meet one or more specified static or dynamic
254 data sheet parameters
255 3.6.
256 coupled non-supply pin pair
257 two pins that have an intended direct current path (such as a pass gate or resistors, such as
258 differential amplifier inputs, or low voltage differential signalling (LVDS) pins), including
259 analogue and digital differential pairs and other special function pairs (e.g., D +/D-,
260 XTALin/XTALout, RFin/RFout, TxP/TxN, RxP/RxN, CCP_DP/CCN_DN, etc.)
261 3.7.
262 data sheet parameters
263 static and dynamic component performance data supplied by the component manufacturer or
264 supplier
265 3.8.
266 exposed pad
267 exposed metal plate on an IC package, connected to the silicon substrate and acting as a heat
268 sink. This metal plate may or may not be electrically connected to the die. The exposed pad
269 may be categorized as either supply, non-supply or no-connect
270 3.9.
271 3.10.
272 feedthrough
273 direct or indirect (via a series resistor) connection from a pad cell layout. This connection may
274 allow additional elements, not included in the pad cell, to make electrical connections to the
275 bond pad (see Annex A). This is not to be confused with the term feed-through used in Clause
276 5 which refers to test boards.
277 3.11.
278 failure window
279 intermediate range of stress voltages that can induce failure in a particular device type, when
280 the device type can pass some stress voltages both higher and lower than this range
281 Note 1 to entry: A component with a failure window can pass a 500 V test, fail a 1 000 V test and pass a 2 000 V
282 test. The withstand voltage of such a device is 500 V.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 9 – 47/2882/CDV
283 3.12.
284 human body model electrostatic discharge
285 HBM ESD
286 ESD event meeting the waveform criteria specified in this document, approximating the
287 discharge from the fingertip of a typical human being to a grounded device
288 3.13.
289 HBM ESD tester
290 HBM simulator
291 equipment that applies an HBM ESD to a component
292 3.14.
293 I
ps
294 peak current value determined by the current at time t on the linear extrapolation of the
max
295 exponential current decay curve, based on the current waveform data over a 40 nanosecond
296 period beginning at t
max
297 SEE: Figure 2 a).
298 3.15.
299 I
psmax
300 highest current value measured including the overshoot or ringing components due to internal
301 test simulator RLC parasitics
302 SEE: Figure 2 a).
303 3.16.
304 no connect pin
305 package interconnection that is not electrically connected to a die
306 EXAMPLE: Pin, bump, ball interconnection.
307 Note 1 to entry: There are some pins which are labelled as no connect, which are actually connected to the die and
308 should not be classified as a no connect pin.
309 3.17.
310 non-socketed tester
311 HBM simulator that makes contact to the device under test (DUT) pins (or balls, lands, bumps
312 or die pads) with test probes rather than placing the DUT in a socket
313 3.18.
314 non-supply pin
315 pin that is not categorized as a supply pin or no connect
316 Note 1 to entry This includes pins such as input, output, offset adjusts, compensation, clocks, controls, address,
317 data, Vref pins and VPP pins on EPROM memory. Most non-supply pins transmit or receive information such as
318 digital or analogue signals, timing, clock signals, and voltage or current reference levels.
319 3.19.
320 package plane
321 low impedance metal layer built into an IC package connecting a group of bumps or pins
322 (typically power or ground)
323 Note 1 to entry: There may be multiple package planes (sometimes referred to as islands) for each power and
324 ground group.
325 3.20.
326 pre-pulse voltage
327 voltage occurring at the device under test (DUT) just prior to the generation of the HBM current
328 pulse
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 10 – 47/2882/CDV
329 SEE: Clause C.2.
330 3.21.
331 pulse generation circuit
332 dual polarity pulse source circuit network that produces a human body discharge current
333 waveform
334 Note 1 to entry The circuit network includes a pulse generator with its test equipment internal path up to the contact
335 pad of the test fixture. This circuit is also referred to as dual polarity pulse source.
336 3.22.
337 ringing
338 high frequency oscillation superimposed on a waveform
339 3.23.
340 shorted non-supply pin
341 any non-supply pin (typically an I/O pin) that is metallically connected (typically 3 ) on the
342 chip or within the package to another non-supply pin (or set of non-supply pins)
343 3.24.
344 socketed tester
345 HBM simulator that makes contact to DUT pins (or balls, lands, bumps or die pads) using a
346 DUT socket mounted on a test fixture board
347 3.25.
348 specification limit
349 SPL
350 HBM specification limit, or target specification level and is the value set by customer
351 requirement or internal target (See Annex A)
352 3.26.
353 spurious current pulse
354 small HBM shaped pulse that follows the main current pulse, and is typically defined as a
355 percentage of I
psmax
356 3.27.
357 step-stress hardening
358 ability of a component subjected to increasing ESD voltage stresses to withstand higher stress
359 levels than a similar component not previously stressed
360 EXAMPLE: A component can fail at 1 000 V if subjected to a single stress, but fail at 3 000 V if stressed
361 incrementally from 250 V.
362 3.28.
363 supply pin
364 any pin that provides current to a circuit
365 Note 1 to entry: Supply pins typically transmit no information (such as digital or analogue signals, timing, clock
366 signals, and voltage or current reference levels). For the purpose of ESD testing, power and ground pins are treated
367 as supply pins.
368 3.29.
369 test fixture board
370 specialized circuit board, with one or more component sockets, which connects the DUT(s) to
371 the HBM simulator
372 3.30.
373 t
max
374 time when I is at its maximum value (I )
ps psmax
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 11 – 47/2882/CDV
375 SEE: Figure 2 a).
376 3.31.
377 trailing current pulse
378 current pulse that occurs after the HBM current pulse has decayed
379 Note 1 to entry: A trailing current pulse is a relatively constant current often lasting for hundreds of microseconds.
380 SEE: Clause C.1.
381 3.32.
382 two-pin HBM tester
383 low parasitic HBM simulator that tests DUTs in pin pairs where floating pins are not connected
384 to the simulator thereby eliminating DUT-tester interactions from parasitic tester loading of
385 floating pins
386 3.33.
387 V1
388 maximum HBM stress voltage step where all of the selected cloned non-supply pins pass (see
389 Annex A)
390 3.34.
391 V2
392 minimum HBM stress voltage step where all the selected cloned non-supply pins fail (see Annex
393 A)
394 3.35.
395 VM
396 minimum HBM stress voltage step where 50% or greater of the selected cloned non-supply pins
397 fail (see Annex A)
398 3.36.
399 withstand voltage
400 highest voltage level that does not cause device failure
401 Note 1 to entry: The device passes all tested lower voltages (see failure window).
403 4. Apparatus and required equipment
404 4.1. Waveform verification equipment
405 All equipment used to evaluate the tester shall be calibrated in accordance with the
406 manufacturer's recommendation. This includes the oscilloscope, current transducer and high
407 voltage resistor load. Maximum time between calibrations shall be one year. Calibration shall
408 be traceable to national or international standards.
409 Equipment capable of verifying the pulse waveforms defined in this standard test method
410 includes, but is not limited to, an oscilloscope, evaluation loads and a current transducer.
411 4.2. Oscilloscope
412 A digital oscilloscope is recommended but analogue oscilloscopes are also permitted. In order
413 to ensure accurate current waveform capture, the oscilloscope shall meet the following
414 requirements:
415 a) minimum sensitivity of 100 mA per major division when used in conjunction with the current
416 transducer specified in 4.4;
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 12 – 47/2882/CDV
417 b) minimum bandwidth of 350 MHz;
418 c) for analogue scopes, minimum writing rate of one major division per nanosecond.
419 4.3. Additional requirements for digital oscilloscopes
420 Where a digital oscilloscope is used, the following additional requirements apply:
421 a) recommended channels: 2 or more;
422 b) minimum sampling rate: 10 samples per second;
423 c) minimum vertical resolution: 8-bit;
424 d) minimum vertical accuracy: 2,5 %;
425 e) minimum time base accuracy: 0,01 %;
426 f) minimum record length: 10 points.
427 4.4. Current probe
428 a) minimum bandwidth of 200 MHz;
429 b) peak pulse capability of 12 A;
430 c) rise time of less than 1 ns;
431 d) capable of accepting a solid conductor as specified in 4.5;
432 e) provides an output voltage per signal current as required in 4.2
433 (this is usually between 1 mV/mA and 5 mV/mA.);
434 f) low-frequency 3 dB point below 10 kHz (e.g., Tektronix CT-2 ) for measurement of decay
435 constant t (see 5.2.3.2, Table 1, and note below).
d
436 NOTE Results using a current probe with a low-frequency 3 dB point of 25 kHz (e.g., Tektronix CT-1 ) to
437 measure decay constant t are acceptable if t is found to be between 130 ns and 165 ns.
d d
438 4.5. Evaluation loads
439 Two evaluation loads are necessary to verify the tester functionality:
2 2
440 a) Load 1: A solid 18 AWG to 24 AWG (non-US standard wire size 0,25 mm to 0,75 mm
441 cross-section) tinned copper shorting wire as short as practicable to span the distance
442 between the two farthest pins in the socket while passing through the current probe or long
443 enough to pass through the current probe and contacted by the probes of the non -socketed
444 tester.
445 b) Load 2: A (500 5) , minimum 4 000 V voltage rating.
446 4.6. Attenuator
447 A 20.0 dB attenuator with a precision of 0.5 dB, at least 1 GHz bandwidth, and an impedance
448 of 50 5 .
449 4.7. Human body model simulator
450 A simplified schematic of the HBM simulator or tester is given in Figure 1. The performance of
451 the tester is influenced by parasitic capacitance and inductance. Thus, construction of a tester
452 using this schematic does not guarantee that it will provide the HBM pulse required for this
___________
Tektronix CT-1 and CT-2 are the trade names of products supplied by Tektronix, Inc.
This information is given for the convenience of users of this document and does not constitute an endorsement
by IEC of the products named. Equivalent products may be used if they can be shown to lead to the same results.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 13 – 47/2882/CDV
453 document. The waveform capture procedures and requirements described in Clause 5
454 determine the acceptability of the equipment for use.
Dual polarity
pulse source
Terminal
R1 1 M S1 R2 1 500
A
Dual
polarity HV
C1 100 pF
supply
Terminal
B
Current
probes
456 Figure 1 – Simplified HBM simulator circuit with loads
457 NOTE 1 The current transducers (probes) are specified in 4.4.
458 NOTE 2 The shorting wire (short) and 500 resistor (R4) are evaluation loads specified in 4.5.
459 NOTE 3 Reversal of Terminals A and B to achieve dual polarity performance is not permitted except under
460 conditions described in, Sections 6.6.2.3 and 6.8.
461 NOTE 4 The charge removal circuit ensures a slow discharge of the device, thus avoiding the possibility of a
462 charged device model discharge. A simple example is a 10 k or larger resistor (possibly in series with a switch) in
463 parallel with the test fixture board. This resistor may also be useful to control parasitic pre -pulse voltages (See Annex
464 C.2 and Annex C.3).
465 NOTE 5 The dual polarity pulse source (generator) shall be designed to avoid recharge transients and double pulses.
466 NOTE 6 Stacking of DUT socket adapters (piggybacking or the insertion of secondary sockets into the main test
467 socket) is allowed only if the secondary socket waveform meets the requirements of this standard defined in Table
468 1.
469 NOTE 7 Component values are nominal.
470 4.8. HBM test equipment parasitic properties
471 Some HBM simulators have been found to incorrectly classify HBM sensitivity levels due to
472 parasitic artifacts or uncontrolled voltages unintentionally built into the HBM simulator ’s
473 environment. Annex C describes methods for determining if these effects are present and
474 optional mitigation techniques. See Annex C.5. for a procedure to determine if an HBM simulator is
475 considered an N-channel low-parasitic HBM simulator for a device with N pins simultaneously connected
476 to the simulator.
479 5. Stress test equipment qualification and routine verification
480 5.1. Overview of required HBM tester evaluations
481 The HBM tester and test fixture boards shall be qualified, re-qualified, and periodically verified
482 as described in Clause 5. A flow chart for this procedure is given in Annex D. The safety precautions
483 described in 5.8 shall be followed at all times.
Charge
removal
circuit
Test
fixture
board
Short
R4 =
500
DUT
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 14 – 47/2882/CDV
484 5.2. Measurement procedures
485 5.2.1. Reference pin pair determination
486 The two pins of each socket on a test fixture board which make up the reference pin pair are:
487 a) the socket pin with the shortest wiring path of the test fixture to the pulse generation circuit
488 (terminal B) and
489 b) the socket pin with the longest wiring path of the test fixture from the pulse generation circuit
490 (terminal A) to the ESD stress socket (See Figure 1).
491 This information is typically provided by the equipment or test fixture board manufacturer. If
492 more than one pulse generation circuit is connected to a socket then there will be more than
493 one reference pin pair.
494 It is strongly recommended that on non-positive clamp fixtures, feed-through test point pads be
495 added on these paths to allow connection of either the shorting wire or 500 load resistor
496 during waveform verification measurements. These test points should be added as close as
497 possible to the socket(s), and if the test fixture board uses more than one pulse generator,
498 multiple feed-through test points should be added for each pulse generator’s longest and
499 shortest paths.
500 NOTE A positive clamp test socket is a zero insertion force (ZIF) socket with a clamping mechanism. It allows the
501 shorting wire to be easily clamped into the socket. Examples are dual in-line package (DIP) and pin grid array (PGA)
502 ZIF sockets.
503 5.2.2. Waveform capture with current probe
504 5.2.2.1 General
505 To capture a current waveform between two socket pins (usually the reference pin pair), use
506 the shorting wire (see 4.5, Load 1) for the short circuit measurement or the 500 resistor (see
507 4.5, Load 2) for the 500 current measurement and the inductive current probe (see 4.4).
508 NOTE: At high stress voltages, an attenuator (4.6) may be necessary to prevent off scale measurements on the
509 oscilloscope and avoid oscilloscope damage. At low stress levels, especially at the 50 V and 125 V levels, an
510 attenuator should not be used when signal levels reach the lower limits of the oscilloscope voltage sensitivity.
511 5.2.2.2 Short circuit current waveform
512 Attach the shorting wire between the pins to be measured. Place the current probe around the
513 shorting wire, as close to terminal B as practical, observing the polarity shown in Figure 1. Apply
514 an ESD stress at the voltage and polarity needed to execute the qualification, re -qualification
515 or periodic verification being conducted.
516 a) For positive clamp sockets, insert the shorting wire between the socket pins connected to
517 terminals A and B and hold in place by closing the clamp.
518 b) For non-positive clamp sockets, attach the shorting wire between the socket pins connected
519 to terminals A and B. If it is not possible to make contact within the socket, connect the
520 shorting wire between the reference pin pair test points or socket mounting holes, if
521 available. The design of the socket is important as some socket types may include contact
522 springs (coils) in their design. These springs can add more parasitic inductance to the signal
523 path and may affect the HBM waveform. Selecting sockets that minimize the use of springs
524 (coils) is recommended, but if this is not possible, then keeping their length as short as
525 possible is recommended.
526 c) For non-socketed testers, place the shorting wire with the inductive current probe on an
527 insulating surface and place the simulator terminal A and terminal B probes on the ends of
528 the wires.
oSIST prEN IEC 60749-26:2025
IEC CDV 60749-26 © IEC 2024 – 15 – 47/2882/CDV
529 5.2.2.3 500 load current waveform
530 Place the current probe around the 500 resistor’s lead, observing the polarity as shown in
531 Fig
...








Questions, Comments and Discussion
Ask us and Technical Secretary will try to provide an answer. You can facilitate discussion about the standard in here.
Loading comments...