EN ISO 11670:2003

SLOVENSKI STANDARD
01-september-2003
1DGRPHãþD
SIST EN ISO 11670:2000
Laserji in laserska oprema - Preskusne metode za parametre laserskega žarka -
Stabilnost položaja žarka (ISO 11670:2003)
Lasers and laser-related equipment - Test methods for laser beam parameters - Beam
positional stability (ISO 11670:2003)
Laser und Laseranlagen - Prüfverfahren für Laserstrahlparameter - Strahllagestabilität
(ISO 11670:2003)
Lasers et équipements associés aux lasers - Méthodes d'essai des parametres du
faisceau laser - Stabilité de visée du faisceau (ISO 11670:2003)
Ta slovenski standard je istoveten z: EN ISO 11670:2003
ICS:
31.260 Optoelektronika, laserska Optoelectronics. Laser
oprema equipment
2003-01.Slovenski inštitut za standardizacijo. Razmnoževanje celote ali delov tega standarda ni dovoljeno.

EUROPEAN STANDARD
EN ISO 11670
NORME EUROPÉENNE
EUROPÄISCHE NORM
April 2003
ICS 31.260 Supersedes EN ISO 11670:1999
English version
Lasers and laser-related equipment - Test methods for laser
beam parameters - Beam positional stability (ISO 11670:2003)
Lasers et équipements associés aux lasers - Méthodes Laser und Laseranlagen - Prüfverfahren für
d'essai des paramètres du faisceau laser - Stabilité de Laserstrahlparameter - Strahllagestabilität (ISO
visée du faisceau (ISO 11670:2003) 11670:2003)
This European Standard was approved by CEN on 21 February 2003.
CEN members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European
Standard the status of a national standard without any alteration. Up-to-date lists and bibliographical references concerning such national
standards may be obtained on application to the Management Centre or to any CEN member.
This European Standard exists in three official versions (English, French, German). A version in any other language made by translation
under the responsibility of a CEN member into its own language and notified to the Management Centre has the same status as the official
versions.
CEN members are the national standards bodies of Austria, Belgium, Czech Republic, Denmark, Finland, France, Germany, Greece,
Hungary, Iceland, Ireland, Italy, Luxembourg, Malta, Netherlands, Norway, Portugal, Slovakia, Spain, Sweden, Switzerland and United
Kingdom.
EUROPEAN COMMITTEE FOR STANDARDIZATION
COMITÉ EUROPÉEN DE NORMALISATION
EUROPÄISCHES KOMITEE FÜR NORMUNG
Management Centre: rue de Stassart, 36  B-1050 Brussels
© 2003 CEN All rights of exploitation in any form and by any means reserved Ref. No. EN ISO 11670:2003 E
worldwide for CEN national Members.

CORRECTED 2003-06-25
Foreword
This document (EN ISO 11670:2003) has been prepared by Technical Committee ISO/TC 172
"Optics and optical instruments" in collaboration with Technical Committee CEN/TC 123 "Lasers
and laser-related equipment", the secretariat of which is held by DIN.
This European Standard shall be given the status of a national standard, either by publication of
an identical text or by endorsement, at the latest by October 2003, and conflicting national
standards shall be withdrawn at the latest by October 2003.
This document supersedes EN ISO 11670:1999.
According to the CEN/CENELEC Internal Regulations, the national standards organizations of
the following countries are bound to implement this European Standard: Austria, Belgium, Czech
Republic, Denmark, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy,
Luxembourg, Malta, Netherlands, Norway, Portugal, Slovakia, Spain, Sweden, Switzerland and
the United Kingdom.
Endorsement notice
The text of ISO 11670:2003 has been approved by CEN as EN ISO 11670:2003 without any
modifications.
NOTE Normative references to International Standards are listed in Annex ZA (normative).
Annex ZA
(normative)
Normative references to international publications
with their relevant European publications
This European Standard incorporates by dated or undated reference, provisions from other
publications. These normative references are cited at the appropriate places in the text and the
publications are listed hereafter. For dated references, subsequent amendments to or revisions of
any of these publications apply to this European Standard only when incorporated in it by
amendment or revision. For undated references the latest edition of the publication referred to
applies (including amendments).
NOTE Where an International Publication has been modified by common modifications, indicated
by (mod.), the relevant EN/HD applies.
Publication Year Title EN Year
ISO 11145 2001 Optics and optical instruments - Lasers EN ISO 11145 2001
and laser-related equipment -
Vocabulary and symbols
ISO 11146 1999 Lasers and laser related equipment - EN ISO 11146 1999
Test methods for laser beam
parameters - Beam widths, divergence
angle and beam propagation factor
INTERNATIONAL ISO
STANDARD 11670
Second edition
2003-04-01
Lasers and laser-related equipment —
Test methods for laser beam
parameters — Beam positional stability
Lasers et équipements associés aux lasers — Méthodes d'essai des
paramètres du faisceau laser — Stabilité de visée du faisceau

Reference number
ISO 11670:2003(E)
©
ISO 2003
ISO 11670:2003(E)
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©
ii ISO 2003 – All rights reserved

ISO 11670:2003(E)
Contents Page
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Coordinate systems and beam axis . 3
4.1 Beam axis distribution . 3
4.2 Coordinate systems . 3
5 Test principles . 5
5.1 Beam positional stability . 5
5.2 Beam angular stability . 5
6 Measurement arrangement, test equipment and auxiliary devices . 5
6.1 Preparation . 5
6.2 Control of environment . 5
6.3 Detection system . 6
6.4 Beam-forming optics, optical attenuators, beam splitters, focusing elements . 6
6.5 Calibration . 6
7 Test procedures . 7
7.1 General . 7
7.2 Beam positional stability . 7
7.3 Beam angular stability . 7
8 Evaluation . 7
8.1 Beam positional stability . 7
8.2 Beam angular stability . 8
9 Test report . 10
Annex A (informative) Propagation of absolute beam stability . 12
Annex B (informative) Decoupling of short- and long-term fluctuations . 15
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ISO 11670:2003(E)
Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards bodies
(ISO member bodies). The work of preparing International Standards is normally carried out through ISO
technical committees. Each member body interested in a subject for which a technical committee has been
established has the right to be represented on that committee. International organizations, governmental and
non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International
Electrotechnical Commission (IEC) on all matters of electrotechnical standardization.
International Standards are drafted in accordance with the rules given in the ISO/IEC Directives, Part 2.
The main task of technical committees is to prepare International Standards. Draft International Standards
adopted by the technical committees are circulated to the member bodies for voting. Publication as an
International Standard requires approval by at least 75 % of the member bodies casting a vote.
Attention is drawn to the possibility that some of the elements of this document may be the subject of patent
rights. ISO shall not be held responsible for identifying any or all such patent rights.
ISO 11670 was prepared by Technical Committee ISO/TC 172, Optics and optical instruments, Subcommittee
SC 9, Electro-optical systems.
This second edition cancels and replaces the first edition (ISO 11670:1999), Clauses 3 and 9 of which have
been technically revised. Annexes A and B have been added.
©
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ISO 11670:2003(E)
Introduction
The centre of a laser beam is defined as the centroid or first-order spatial moment of the power density
distribution. The current propagation axis of a beam is then the straight line connecting two centroids measured
at two different planes simultaneously in a uniform, homogeneous medium. Beam axis instability may be
characterized by transverse displacements and angular movements that are either monotonic, periodic or
stochastic in time.
The movement of a laser beam may be randomly distributed and uniform in amplitude in all directions. In
general, the beam may move a greater amount in one direction. If one direction predominates, the procedures
specified in this International Standard can be used to identify that dominant direction (the beam x-axis) and its
azimuthal location relative to the axes of the laboratory system.
This International Standard provides general principles for the measurement of these quantities. In addition,
definitions of terminology and symbols to be used in referring to beam position are provided.
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.
vi
INTERNATIONAL STANDARD ISO 11670:2003(E)
Lasers and laser-related equipment — Test methods for laser
beam parameters — Beam positional stability
1Scope
This International Standard specifies methods for determining laser beam positional as well as angular stability.
The test methods given in this International Standard are intended to be used for the testing and
characterization of lasers.
2 Normative references
The following referenced documents are indispensable for the application of this document. For dated
references, only the edition cited applies. For undated references, the latest edition of the referenced document
(including any amendments) applies.
ISO 11145:2001, Optics and optical instruments — Lasers and laser-related equipment — Vocabulary and
symbols
ISO 11146:1999, Lasers and laser-related equipment — Test methods for laser beam parameters — Beam
widths, divergence angle and beam propagation factor
IEC 61040:1990, Power and energy measuring detectors, instruments and equipment for laser radiation
3 Terms and definitions
For the purposes of this document, the terms and definitions given in IEC 61040, ISO 11145 and ISO 11146
and the following apply.
3.1
angular movement
α , α
x y
angular movement of the laser beam in the xz- and y-z planes, respectively
NOTE These quantities are defined in the beam axis system xy, ,z. If the ratio of the quantity in the x direction to that in the
y direction does not exceed 1,15:1, the quantity is regarded as rotationally symmetric and only one number may be given.
The symbol α without index is used in that case.
3.2
beam angular stability
δα , δα
x y
twice the standard deviation of the measured angular movement
NOTE These quantities are defined in the beam axis system xy, ,z. If the ratio of the quantity in the x direction to that in the
y direction does not exceed 1,15:1, the quantity is regarded as rotationally symmetric and only one number may be given.
The symbol δα without index is used in that case.
3.3
pivot
point of intersection of all momentary beam axes with the z-axis
NOTE The measurement of the pivot is not a subject of this International Standard, because it does not necessarily exist.
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ISO 11670:2003(E)
3.4
transverse displacement
a , a
x y
distance of transverse displacement of the laser beam in the xy- and -directions, respectively
NOTE 1 These quantities are defined in the beam axis system xy, ,z. If the ratio of the quantity in the x direction to that in
the y direction does not exceed 1,15:1, the quantity is regarded as rotationally symmetric and only one number may be
given. The symbol a without index is used in that case.
NOTE 2 The measurement of the transverse displacement is not a subject of this International Standard.
3.5
beam positional movement
�
positional movement of the centroid of the laser beam in the plane z
�
NOTE The positional movement at plane z results from the superposition of transverse displacement and/or angular
movement of the laser beam.
3.6
beam positional stability
� �
∆ (z ), ∆ (z )
x y
�
four times the standard deviation of the measured beam positional movement at plane z
NOTE These quantities are defined in the beam axis system xy, ,z. If the ratio of the quantity in the x direction to that in the
y direction does not exceed 1,15:1, the quantity is regarded as rotationally symmetric and only one number may be given.
�
The symbol ∆(z ) without index is used in that case.
3.7
relative beam angular stability
δα , ,δα δα
rel,x rel,y rel,
beam angular stability divided by the divergence angle
�
� �
1 2 2
NOTE For elliptical beams, an effective divergence angle θ = θ +θ should be used, since the principal axes
eff x y
of the beam positional stability in general will not coincide with the principal axes of the laser beam propagation.
3.8
relative beam positional stability
� � �
∆ (z ), , ∆ (z ) ∆ (z )
rel,x rel,y rel,
� �
beam positional stability at plane z divided by the beam diameter at plane z
�
� �
1 2 2
NOTE For elliptical beams, an effective beam diameter d = d +d should be used, since the principal axes of
eff
x y
the beam positional stability in general will not coincide with the principal axes of the laser beam propagation.
3.9
beam stability parameter product
S, ,S S
x y
The product of the minimum beam positional stability along the propagation and the beam angular stability
NOTE In a way similar to the beam diameter, the beam positional stability, as defined in sub-clause 3.6, obeys a hyperbolic
propagation law. Thus, the propagation of the absolute beam stability can be completely characterized by three parameters:
the position z of the minimum value of the beam positional stability, the minimum value of the beam positional stability ∆
0 0
and the beam angular stability αz. The position of the minimum value of the beam positional stability in general does not
coincide with the waist position of the laser beam. See Annex A for further details.
3.10
beam positional change from cold start
difference in beam position from the position noted immediately upon turning on a turned-off, ambient-
temperature-equilibrated laser and the position noted after that laser has operated for longer than the warm-up
time
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ISO 11670:2003(E)
3.11
short-term stability
stability within a time interval of 1s
3.12
medium-term stability
stability within a time interval of 1 min
3.13
long-term stability
stability within a time interval of 1h
4 Coordinate systems and beam axis
4.1 Beam axis distribution
The distribution of the beam axes (as defined in ISO 11145) is obtained from a significant number (n� 1 000)
of measurements of the beam axis direction.
The movement of the beam axis can be described by means of the standard deviation of this beam axis
distribution. This standard deviation can vary in different directions. This means that the amplitude of the beam
movement can be greater in one dominant direction than in another, and that the distribution of beam axis
movements is not necessarily radially symmetric.
4.2 Coordinate systems
4.2.1 General
All coordinate systems are defined as right-handed.
Key
1 average direction of the beam propagation axes
2 beam axis (for one measurement)
3 two times the standard deviation of the beam axis distribution
� � �
Figure 1 — Coordinate systems x ,y ,z and xy, ,z
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ISO 11670:2003(E)
4.2.2 Laboratory system
� � � �
The x , y and z axes define the orthogonal space directions in the laboratory system. The origin of the z -axis
� �
is in a reference (x -y )-plane defined by the laser manufacturer (e.g. the front of the laser enclosure), so that
◦ �
the beam propagates approximately (less than 10 deviation) along the z -axis.
4.2.3 Beam axis system
A second orthogonal coordinate system, the beam axis system, is defined in the following way:
— the z-axis is the average direction of the beam propagation axis (first-order spatial moment of the beam axis
distribution), which shall be determined after the laser has reached a steady state;
— the x-axis is the direction of maximum amplitude of mo
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