Standard Guide for Ultra Pure Water Used in the Electronics and Semiconductor Industry

SCOPE
1.1 This guide covers the recommendations for the purity of water suitable for use in the electronics and microelectronics industry for purposes such as the washing and rinsing of semiconductor components in cleaning and etching operations, making steam for oxidation of silicon surfaces, photomask preparation, luminescent material deposition, and similar applications relating to the development and fabrication of solid state, thin film, communication lasers, light emitting diodes, photodetector, printed circuit, memory, vacuum tube, or electrolytic devices.
1.2 The values stated in SI units are to be regarded as standard. The inch-pound units given in parentheses are for information only.
1.3 This standard does not purport to address the safety problems associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

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Publication Date
09-Jun-1999
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ASTM D5127-99 - Standard Guide for Ultra Pure Water Used in the Electronics and Semiconductor Industry
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NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
Contact ASTM International (www.astm.org) for the latest information
Designation:D5127–99
Standard Guide for
Ultra Pure Water Used in the Electronics and
1
Semiconductor Industry
This standard is issued under the fixed designation D 5127; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
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1. Scope Absorption Spectrophotometry
D 4327 Test Method for Anions by Chemically Suppressed
1.1 This guide provides recommendations for water quality
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Ion Chromatography
related to current electronics and semiconductor industry
2
D 4453 Practice for Handling of Ultra Pure Water Samples
requirements.
D 4517 Test Method for Low-Level Total Silica in High-
1.2 Water is used for washing and rinsing of semiconductor
Purity Water by Flameless Atomic Absorption Spectros-
components during manufacture. It is also used for cleaning
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copy (GFAAS)
and etching operations, making steam for oxidation of silicon
D 4779 Test Method forTotal, Organic or Inorganic Carbon
surfaces, photomask preparation and luminescent material
in High-Purity Water by Ultraviolet (UV) or Both, or by
deposition. Other applications are in the development and
High Temperature Combustion Followed by Gas Phase
fabrication of solid state, thin film, communication lasers, light
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NDIR or Electrolytic Conductivity
emitting diodes, photo-detectors, printed circuits, memory,
D 5173 Test Method for On-Line Monitoring of Carbon
vacuum tube, or electrolytic devices.
CompoundsinWaterbyChemicalOxidation,byUVLight
1.3 Thisguidealsoprovidesrecommendationsforultrapure
Oxidation, by Both, or by High Temperature Combustion
waterqualityrelatedtoindustryrequirementsforproductionof
Followed by Gas Phase NDIR or Electrolytic Conductiv-
devices having line widths from 5 to 0.18 µm.
2
ity
1.4 This standard does not purport to address all of the
D 5391 Test Method for Electrical Conductivity and Resis-
safety concerns, if any, associated with its use. It is the
2
tivity of a Flowing High Purity Water Sample
responsibility of the user of this standard to establish appro-
D 5462 Test Method for On-Line Measurement of Dis-
priate safety and health practices and determine the applica-
2
solved Oxygen in Water
bility of regulatory limitations prior to use.
D 5542 TestMethodsforTraceAnionsinHighPurityWater
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2. Referenced Documents
by Ion Chromatography
D 5544 Test Method for On-Line Measurement of Residue
2.1 ASTM Standards:
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2
after Evaporation of High-Purity Water
D 1129 Terminology Relating to Water
2
D 5673 Test Method for Elements in Water by Inductively-
D 1193 Specification for Reagent Water
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Coupled Argon Plasma Mass Spectrometry (ICP-MS)
D 1976 Test Method for Elements in Water by Inductively-
D 5996 Test Method for Measuring Anionic Contaminants
Coupled Argon Plasma Atomic Emission Spectroscopy
2
2
in High-Purity Water by On-Line Ion Chromatography
(ICP-AES)
D 5997 Test Method for On-Line Monitoring of Total Car-
D 2791 Test Method for Continuous Determination of So-
2
bon, Inorganic Carbon, in Water by Ultraviolet, Persulfate
dium in Water
2
Oxidation, and Membrane Conductivity Detection
D 3919 Practice for Measuring Trace Elements in Water by
2
F 1094 Test Methods for Microbiological Monitoring of
Graphite Furnace Atomic Absorption Spectrophotometry
Water Used for Processing Electron and Microelectronic
D 4191 Test Method for Sodium in Water by Atomic
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Devices by Direct-PressureTap SamplingValve and by the
Absorption Spectrophotometry
4
Pre-Sterilized Plastic Bag Method
D 4192 Test Method for Potassium in Water by Atomic
3. Terminology
1 3.1 Definitions— For definitions of terms used in this guide
This guide is under the jurisdiction of ASTM Committee D19 on Water and is
the direct responsibility of Subcommittee D19.02 on General Specifications, refer to Terminology D 1129.
Technical Resources, and Statistical Methods.
Current edition approved June 10, 1999. Published September 1999. Originally
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published as D 5127 – 90. Last previous edition D 5127 – 98. Annual Book of ASTM Standards, Vol 11.02.
2 4
Annual Book of ASTM Standards, Vol 11.01. Annual Book of ASTM Standards, Vol 10.04.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.
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D5127–99
3.2 Definitions of Terms Specific to This Standard: 4. Significance and Use
3.2.1 endotoxins, n—substances or by-products usually pro-
4.1 This guide recommends the water quality required for
duced by gram negative microorganisms that give a positive the electronic and microelectronic industry. High purity water
test for pyrogens, determined in accordance with the limulus is re
...

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