Microbeam analysis — Electron backscatter diffraction — Measurement of average grain size

This document describes procedures for measuring average grain size derived from a two-dimensional polished cross-section using electron backscatter diffraction (EBSD). This requires the measurement of orientation, misorientation and pattern quality factor as a function of position in the crystalline specimen[1]. The measurements in this document are made on two dimensional sections. The reader should note carefully the definitions used (3.3) which draw a distinction between the measured sectional grain sizes, and the mean grain size which can be derived from them that relates to the three dimensional grain size. NOTE 1 While conventional methods for grain size determination using optical microscopy are well-established, EBSD methods offer a number of advantages over these techniques, including increased spatial resolution and quantitative description of the orientation of the grains. NOTE 2 The method also lends itself to the measurement of the grain size of complex materials, for example those with a significant duplex content. NOTE 3 The reader is warned to interpret the results with care when attempting to investigate specimens with high levels of deformation.

Analyse par microfaisceaux — Diffraction d'électrons rétrodiffusés — Mesurage de la taille moyenne des grains

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Status
Published
Publication Date
14-Jul-2020
Current Stage
9092 - International Standard to be revised
Due Date
30-Oct-2024
Completion Date
30-Oct-2024
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INTERNATIONAL ISO
STANDARD 13067
Second edition
2020-07
Microbeam analysis — Electron
backscatter diffraction —
Measurement of average grain size
Analyse par microfaisceaux — Diffraction d'électrons rétrodiffusés —
Mesurage de la taille moyenne des grains
Reference number
©
ISO 2020
© ISO 2020
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting
on the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address
below or ISO’s member body in the country of the requester.
ISO copyright office
CP 401 • Ch. de Blandonnet 8
CH-1214 Vernier, Geneva
Phone: +41 22 749 01 11
Email: copyright@iso.org
Website: www.iso.org
Published in Switzerland
ii © ISO 2020 – All rights reserved

Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
3.1 Terminology associated with EBSD measurement of grain size . 2
3.2 Terminology associated with grains and grain boundaries determined via EBSD . 4
3.3 Terminology associated within grain size measurement . 5
3.4 Terminology associated with data correction and uncertainty of EBSD maps . 6
4 Equipment for grain sizing by EBSD . 7
4.1 Hardware requirements . . 7
4.2 Software requirements . 7
5 Acquiring the map for grain sizing by EBSD . 7
5.1 Specimen preparation . 7
5.2 Defining specimen axes . 7
5.3 Stage positioning and calibration . 8
5.4 Linear calibration . 8
5.5 Preliminary examination . . 8
5.6 Choice of step size . 8
[7][8]
5.7 Determination of the level of angular accuracy needed .10
5.8 Choice of areas to be mapped and map size .10
5.9 Considerations when examining plastically deformed materials .11
6 Analytical procedure .11
6.1 Definition of boundaries .11
6.1.1 Grain boundary angles .11
6.1.2 Handling incomplete boundaries .12
6.1.3 Dealing with special boundaries .12
6.2 Post-acquisition treatment of raw data .12
6.3 Data-cleaning steps .12
6.4 Measurement of sectional grain size .16
6.5 Calculation of average grain size .16
6.6 Representation of data .17
7 Measurement uncertainty .17
8 Reporting of analysis results .18
Annex A (informative) Grain size measurement .20
Annex B (informative) Reproducibility.22
Bibliography .25
Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
bodies (ISO member bodies). The work of preparing International Standards is normally carried out
through ISO technical committees. Each member body interested in a subject for which a technical
committee has been established has the right to be represented on that committee. International
organizations, governmental and non-governmental, in liaison with ISO, also take part in the work.
ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of
electrotechnical standardization.
The procedures used to develop this document and those intended for its further maintenance are
described in the ISO/IEC Directives, Part 1. In particular, the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
editorial rules of the ISO/IEC Directives, Part 2 (see www .iso .org/ directives).
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of
any patent rights identified during the development of the document will be in the Introduction and/or
on the ISO list of patent declarations received (see www .iso .org/ patents).
Any trade name used in this document is information given for the convenience of users and does not
constitute an endorsement.
For an explanation of the voluntary nature of standards, the meaning of ISO specific terms and
expressions related to conformity assessment, as well as information about ISO's adherence to the
World Trade Organization (WTO) principles in the Technical Barriers to Trade (TBT), see www .iso .org/
iso/ foreword .html.
This document was prepared by Technical Committee ISO/TC 202, Microbeam analysis.
This second edition cancels and replaces the first edition (ISO 13067:2011), which has been technically
revised. The main changes compared to the previous edition are as follows:
— Data from a round robin (Annex B) have been used to:
— Include information on expected precision (Clause 7 and Annex B);
— Include more detail on sources of errors (Clause 7);
— Clarify statements on minimum numbers of grains measured (5.8) and acceptable clean up
procedures (6.3–6.3);
— Clarify the distinction between sectional grain size measured on a 2D section and average
grain size determined from some 2D measurements of grain sections which can be related by
stereology to the 3D grain size;
— Additionally, improvements have been made to the description of calculation of average values
(6.5) and representation of the data (6.6).
Any feedback or questions on this document should be directed to the user’s national standards body. A
complete listing of these bodies can be found at www .iso .org/ members .html.
iv © ISO 2020 – All rights reserved

Introduction
The mechanical and electromagnetic properties of engineering materials are strongly influenced
by their crystal grain size and distribution. For example, strength, toughness and hardness are
all important engineering properties that are strongly influenced by these parameters. Both bulk
materials and thin films, even as narrow two-dimensional structures, are influenced by grain size. For
this reason, it is important to have standard methods for its measurement with commonly used and
agreed terminology. This document describes procedures for measuring average grain size from maps
of local orientation measurements using electron backscatter diffraction.
INTERNATIONAL STANDARD ISO 13067:2020(E)
Microbeam analysis — Electron backscatter diffraction —
Measurement of average grain size
1 Scope
This document describes procedures for measuring average grain size derived from a two-dimensional
polished cross-section using electron backscatter diffraction (EBSD). This requires the measurement
of orientation, misorientation and pattern quality factor as a function of position in the crystalline
[1]
specimen . The measurements in this document are made on two dimensional sections. The reader
should note carefully the definitions used (3.3) which draw a distinction between the measured
sectional grain sizes, and the mean grain size which can be derived from them that relates to the three
dimensional grain size.
NOTE 1 While conventional methods for grain size determination using optical microscopy are well-
established, EBSD methods offer a number of advantages over these techniques, including increased spatial
resolution and quantitative description of the orientation of the grains.
NOTE 2 The method also lends itself to the measurement of the grain size of complex materials, for example
those with a significant duplex content.
NOTE 3 The reader is warned to interpret the results with care when attempting to investigate specimens
with high levels of deformation.
2 Normative references
The following documents are referred to in the text in such a way that some or all of their content
constitutes requirements of this document. For dated references, only the edition cited applies. For
undated references, the latest edition of the referenced document (including any amendments) applies.
ISO 16700, Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image
magnification
ISO/IEC 17025, General requirements for the competence of testing and calibration laboratories
ISO 23833, Microbeam analysis — Electron probe microanalysis (EPMA) — Vocabulary
ISO 24173, Microbeam analysis — Guidelines for orientation measurement using electron backscatter
diffraction
3 Terms and definitions
For the purposes of this document, the terms and definitions given in ISO 24173 and ISO 23833 and the
following apply.
ISO and IEC maintain terminological databases for use in standardization at the following addresses:
— ISO Online browsing platform: available at https:// www .iso .org/ obp
— IEC Electropedia: available at http:// www .electropedia .org/
3.1 Terminology associated with EBSD measurement of grain size
3.1.1
step size
distance between adjacent points from which individual EBSD patterns are acquired during collection
of data for an EBSD map
3.1.2
pixel
picture element
smallest area of an EBSD map, with the dimensions of the step size (3.1.1), to which is assigned the
result of a single orientation (3.1.3) measurement made by stopping the beam at a point at the centre of
that area
3.1.3
orientation
mathematical description of the angular relationship between the crystal axes
...


INTERNATIONAL ISO
STANDARD 13067
Second edition
2020-07
Microbeam analysis — Electron
backscatter diffraction —
Measurement of average grain size
Analyse par microfaisceaux — Diffraction d'électrons rétrodiffusés —
Mesurage de la taille moyenne des grains
Reference number
©
ISO 2020
© ISO 2020
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting
on the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address
below or ISO’s member body in the country of the requester.
ISO copyright office
CP 401 • Ch. de Blandonnet 8
CH-1214 Vernier, Geneva
Phone: +41 22 749 01 11
Email: copyright@iso.org
Website: www.iso.org
Published in Switzerland
ii © ISO 2020 – All rights reserved

Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
3.1 Terminology associated with EBSD measurement of grain size . 2
3.2 Terminology associated with grains and grain boundaries determined via EBSD . 4
3.3 Terminology associated within grain size measurement . 5
3.4 Terminology associated with data correction and uncertainty of EBSD maps . 6
4 Equipment for grain sizing by EBSD . 7
4.1 Hardware requirements . . 7
4.2 Software requirements . 7
5 Acquiring the map for grain sizing by EBSD . 7
5.1 Specimen preparation . 7
5.2 Defining specimen axes . 7
5.3 Stage positioning and calibration . 8
5.4 Linear calibration . 8
5.5 Preliminary examination . . 8
5.6 Choice of step size . 8
[7][8]
5.7 Determination of the level of angular accuracy needed .10
5.8 Choice of areas to be mapped and map size .10
5.9 Considerations when examining plastically deformed materials .11
6 Analytical procedure .11
6.1 Definition of boundaries .11
6.1.1 Grain boundary angles .11
6.1.2 Handling incomplete boundaries .12
6.1.3 Dealing with special boundaries .12
6.2 Post-acquisition treatment of raw data .12
6.3 Data-cleaning steps .12
6.4 Measurement of sectional grain size .16
6.5 Calculation of average grain size .16
6.6 Representation of data .17
7 Measurement uncertainty .17
8 Reporting of analysis results .18
Annex A (informative) Grain size measurement .20
Annex B (informative) Reproducibility.22
Bibliography .25
Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
bodies (ISO member bodies). The work of preparing International Standards is normally carried out
through ISO technical committees. Each member body interested in a subject for which a technical
committee has been established has the right to be represented on that committee. International
organizations, governmental and non-governmental, in liaison with ISO, also take part in the work.
ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of
electrotechnical standardization.
The procedures used to develop this document and those intended for its further maintenance are
described in the ISO/IEC Directives, Part 1. In particular, the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
editorial rules of the ISO/IEC Directives, Part 2 (see www .iso .org/ directives).
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of
any patent rights identified during the development of the document will be in the Introduction and/or
on the ISO list of patent declarations received (see www .iso .org/ patents).
Any trade name used in this document is information given for the convenience of users and does not
constitute an endorsement.
For an explanation of the voluntary nature of standards, the meaning of ISO specific terms and
expressions related to conformity assessment, as well as information about ISO's adherence to the
World Trade Organization (WTO) principles in the Technical Barriers to Trade (TBT), see www .iso .org/
iso/ foreword .html.
This document was prepared by Technical Committee ISO/TC 202, Microbeam analysis.
This second edition cancels and replaces the first edition (ISO 13067:2011), which has been technically
revised. The main changes compared to the previous edition are as follows:
— Data from a round robin (Annex B) have been used to:
— Include information on expected precision (Clause 7 and Annex B);
— Include more detail on sources of errors (Clause 7);
— Clarify statements on minimum numbers of grains measured (5.8) and acceptable clean up
procedures (6.3–6.3);
— Clarify the distinction between sectional grain size measured on a 2D section and average
grain size determined from some 2D measurements of grain sections which can be related by
stereology to the 3D grain size;
— Additionally, improvements have been made to the description of calculation of average values
(6.5) and representation of the data (6.6).
Any feedback or questions on this document should be directed to the user’s national standards body. A
complete listing of these bodies can be found at www .iso .org/ members .html.
iv © ISO 2020 – All rights reserved

Introduction
The mechanical and electromagnetic properties of engineering materials are strongly influenced
by their crystal grain size and distribution. For example, strength, toughness and hardness are
all important engineering properties that are strongly influenced by these parameters. Both bulk
materials and thin films, even as narrow two-dimensional structures, are influenced by grain size. For
this reason, it is important to have standard methods for its measurement with commonly used and
agreed terminology. This document describes procedures for measuring average grain size from maps
of local orientation measurements using electron backscatter diffraction.
INTERNATIONAL STANDARD ISO 13067:2020(E)
Microbeam analysis — Electron backscatter diffraction —
Measurement of average grain size
1 Scope
This document describes procedures for measuring average grain size derived from a two-dimensional
polished cross-section using electron backscatter diffraction (EBSD). This requires the measurement
of orientation, misorientation and pattern quality factor as a function of position in the crystalline
[1]
specimen . The measurements in this document are made on two dimensional sections. The reader
should note carefully the definitions used (3.3) which draw a distinction between the measured
sectional grain sizes, and the mean grain size which can be derived from them that relates to the three
dimensional grain size.
NOTE 1 While conventional methods for grain size determination using optical microscopy are well-
established, EBSD methods offer a number of advantages over these techniques, including increased spatial
resolution and quantitative description of the orientation of the grains.
NOTE 2 The method also lends itself to the measurement of the grain size of complex materials, for example
those with a significant duplex content.
NOTE 3 The reader is warned to interpret the results with care when attempting to investigate specimens
with high levels of deformation.
2 Normative references
The following documents are referred to in the text in such a way that some or all of their content
constitutes requirements of this document. For dated references, only the edition cited applies. For
undated references, the latest edition of the referenced document (including any amendments) applies.
ISO 16700, Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image
magnification
ISO/IEC 17025, General requirements for the competence of testing and calibration laboratories
ISO 23833, Microbeam analysis — Electron probe microanalysis (EPMA) — Vocabulary
ISO 24173, Microbeam analysis — Guidelines for orientation measurement using electron backscatter
diffraction
3 Terms and definitions
For the purposes of this document, the terms and definitions given in ISO 24173 and ISO 23833 and the
following apply.
ISO and IEC maintain terminological databases for use in standardization at the following addresses:
— ISO Online browsing platform: available at https:// www .iso .org/ obp
— IEC Electropedia: available at http:// www .electropedia .org/
3.1 Terminology associated with EBSD measurement of grain size
3.1.1
step size
distance between adjacent points from which individual EBSD patterns are acquired during collection
of data for an EBSD map
3.1.2
pixel
picture element
smallest area of an EBSD map, with the dimensions of the step size (3.1.1), to which is assigned the
result of a single orientation (3.1.3) measurement made by stopping the beam at a point at the centre of
that area
3.1.3
orientation
mathematical description of the angular relationship between the crystal axes
...

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