CEN/TS 17629:2021

SLOVENSKI STANDARD
01-september-2021
Nanotehnologije - Nano- in mikropreskus praskanja
Nanotechnologies - Nano- and micro- scale scratch testing
Nanotechnologien - Nano- und Mikro-Ritzprüfung
Nanotechnologies - Tests de résistance à l'échelle nanométrique et microscopique
Ta slovenski standard je istoveten z: CEN/TS 17629:2021
ICS:
07.120 Nanotehnologije Nanotechnologies
2003-01.Slovenski inštitut za standardizacijo. Razmnoževanje celote ali delov tega standarda ni dovoljeno.

CEN/TS 17629
TECHNICAL SPECIFICATION
SPÉCIFICATION TECHNIQUE
June 2021
TECHNISCHE SPEZIFIKATION
ICS 07.120
English Version
Nanotechnologies - Nano- and micro- scale scratch testing
Nanotechnologies - Essais de rayure aux échelles nano- Nanotechnologien - Nano- und Mikro-Ritzprüfung
et micro métriques
This Technical Specification (CEN/TS) was approved by CEN on 9 May 2021 for provisional application.

The period of validity of this CEN/TS is limited initially to three years. After two years the members of CEN will be requested to
submit their comments, particularly on the question whether the CEN/TS can be converted into a European Standard.

CEN members are required to announce the existence of this CEN/TS in the same way as for an EN and to make the CEN/TS
available promptly at national level in an appropriate form. It is permissible to keep conflicting national standards in force (in
parallel to the CEN/TS) until the final decision about the possible conversion of the CEN/TS into an EN is reached.

CEN members are the national standards bodies of Austria, Belgium, Bulgaria, Croatia, Cyprus, Czech Republic, Denmark, Estonia,
Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway,
Poland, Portugal, Republic of North Macedonia, Romania, Serbia, Slovakia, Slovenia, Spain, Sweden, Switzerland, Turkey and
United Kingdom.
EUROPEAN COMMITTEE FOR STANDARDIZATION
COMITÉ EUROPÉEN DE NORMALISATION

EUROPÄISCHES KOMITEE FÜR NORMUNG

CEN-CENELEC Management Centre: Rue de la Science 23, B-1040 Brussels
© 2021 CEN All rights of exploitation in any form and by any means reserved Ref. No. CEN/TS 17629:2021 E
worldwide for CEN national Members.

Contents Page
European foreword . 3
Introduction . 3
1 Scope . 5
2 Normative references . 5
3 Terms and definitions . 5
4 Symbols and abbreviations . 7
5 Principle . 9
5.1 General . 9
5.2 Friction . 9
5.3 Factors influencing the critical forces . 9
5.4 Multiple pass testing . 11
6 Apparatus and materials . 12
6.1 Apparatus . 12
6.2 Probes. 14
6.3 Test environment . 16
7 Preparation of test-pieces . 16
7.1 Roughness . 16
7.2 Test-piece cleaning . 16
8 Test procedures . 17
8.1 General . 17
8.2 Zero-point determination . 17
8.3 Test force . 18
8.4 Test profiles . 18
8.5 Test procedures . 18
9 Analysis of results . 23
9.1 General . 23
9.2 Single pass ramping force . 23
9.3 Single pass constant force . 26
9.4 Multi-pass ramping force . 26
9.5 Multi-pass constant force . 26
10 Test reproducibility, repeatability and limits . 27
11 Test report . 28
Annex A (normative) Procedures for determination of probe area function or radius function . 29
Bibliography . 34

European foreword
This document (CEN/TS 17629:2021) has been prepared by Technical Committee CEN/TC 352
“Nanotechnologies”, the secretariat of which is held by AFNOR.
Attention is drawn to the possibility that some of the elements of this document may be the subject of patent
rights. CEN shall not be held responsible for identifying any or all such patent rights.
According to the CEN/CENELEC Internal Regulations, the national standards organisations of the following
countries are bound to announce this Technical Specification: Austria, Belgium, Bulgaria, Croatia, Cyprus,
Czech Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia,
Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Republic of North Macedonia, Romania,
Serbia, Slovakia, Slovenia, Spain, Sweden, Switzerland, Turkey and the United Kingdom.
Introduction
The test procedure is intended to complement other standards which are concerned with the scratch
resistance of materials. This procedure extends the use of the nano- and micro- single pass scratch test to bulk
and coated materials, additionally covering the use of multiple pass nano- and micro- scratch tests.
The method described is not intended to be used to define how particles are released from a surface under
this type of damage.
Several measurement techniques are described, according to the following procedures:
— Constant force scratch test
Single movement of a normally loaded probe (constant force) onto a test piece; friction force and
displacement of the probe (relative to the test piece) are measured along the scratch path.
— Ramped force scratch test
Single movement of a progressively normally loaded probe (ramped force) onto a test piece; friction force
and displacement of the probe (relative to the test piece) are measured along the scratch path.
— Multi-pass unidirectional constant force scratch test
Repeated movement of a normally loaded probe (constant force) onto a test piece, following the same
track; the variation in friction force and displacement of the probe (relative to the piece test) are measured
along the scratch path. First introduced by Bull and Rickerby [1], this test is also called “nanowear” when
used in the nano scratch range and provides information regarding the fatigue behaviour of the test piece
as an effective low cycle fatigue test.
— Progressive force “3-scan” scratch test
Three repetitive unidirectional movement of a normally loaded probe onto a test piece, along the same
track. The first movement of the probe is carried out at constant force (low force) and performed as a
topography scan of a non-scratched test piece surface. The second movement of the probe is achieved
with a progressively increased normal force onto the test piece (from low to high forces). The third
movement of the probe is similar to the first movement, at low force, to acquire a topography of the
scratch carried out in the test piece. This test is also called “scratch topography multi-pass test” and was
first reported by Wu and co-workers [2], [3], which enables identification of failure mechanisms and
provides more details regarding the impact of stress such as the critical force for onset of non-elastic
deformation and the yield pressure (estimated from mean pressure at critical force).
1 Scope
This document specifies a method for measuring the scratch resistance and failure behaviour for advanced
materials and coatings by means of nano- and micro- scale scratch experiments. The method provides data on
both the physical damage to test-pieces and the friction generated between the probe and the test-piece under
single pass and multiple pass conditions. The force range in these tests is from 1 µN up to 2 N.
The test method is not applicable to coatings as defined in EN ISO 4618 [18].
2 Normative references
There are no normative references in this document.
3 Terms and definitions
For the purposes of this document, the following terms and definitions apply.
ISO and IEC maintain terminological databases for use in standardization at the following addresses:
— ISO Online browsing platform: available at https://www.iso.org/obp
— IEC Electropedia: available at https://www.electropedia.org/
3.1
nanoscale
size range between approximately 1 nm and 100 nm
Note 1 to entry: Properties that are not extrapolations from a larger size are predominately exhibited in this size range.
Note 2 to entry: The lower limit in this definition (approximately 1 nm) is introduced to avoid single and small groups
of atoms from being designated as nano-objects or elements of nanostructures, which might be implied by the absence
of a lower limit.
Note 3 to entry: EN ISO 14577-1 defines nano range for indentation depth as less than 200 nm and has a force criterion
for tests in the micro range.
[SOURCE: CEN ISO/TS 80004-1:2015, 2.1 [17], modified]
3.2
microscale
size range between 100 nm and 100 µm
3.3
topographical profiling
scans carried out for topographical profiling sequence (e.g. 3-pass scratch test: pre-scanning and post-
scanning under minimal force), the purpose of which is to measure the topographical profile of the surface
before and after the scratch test
Note 1 to entry: The load of the scan should be kept to a minimum to avoid plastic deformation.
Note 2 to entry: Scans have to move in the same direction to avoid uncertainties in displacement recording and scanning
movements have to be longer than scratching ones to cover the starting- and ending part of the scratch and providing
undeformed areas for checking instrument drift. The force during the scanning movements shall be low enough to ensure
that any deformation is elastic.
Note 3 to entry: The probe radius needs to be small enough to give sufficient resolution for the analysis of the profile of
the surface.
3.4
critical points on the scratch track
points on the scratch track, where any new damage process starts as a function of the track length, normal-
force or other me
...