ASTM D4002-81(2023)

This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the
Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Designation: D4002 − 81 (Reapproved 2023)
Standard Practice for
Evaluation of Buffable Shoe Polish
This standard is issued under the fixed designation D4002; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (´) indicates an editorial change since the last revision or reapproval.
1. Scope product, a modified formulation of the test polish, etc. The one
stipulation is that, the control polish be of the same or similar
1.1 This practice covers the definition of properties to test
type as the test polish. For example, if the test polish is an
and the apparatus to use, in evaluating the performance of
aerosol-emulsion polish, the control should be an aerosol-
buffable shoe polishes.
emulsion polish. It would not be meaningful to select a paste or
1.2 This standard does not purport to address all of the
liquid product as a control for comparison to an aerosol-
safety concerns, if any, associated with its use. It is the
emulsion test polish.
responsibility of the user of this standard to establish appro-
priate safety, health, and environmental practices and deter-
4.3 Test Substrates—The test substrate should be one for
mine the applicability of regulatory limitations prior to use.
which the test polish is intended. Separate tests should be
1.3 This international standard was developed in accor-
conducted for smooth-grained leather substrates to which the
dance with internationally recognized principles on standard-
most current leather finishes have been applied at a tannery.
ization established in the Decision on Principles for the
The finished leather should be the exact type normally used by
Development of International Standards, Guides and Recom-
the shoe manufacturer to fabricate everyday dress shoes. Test
mendations issued by the World Trade Organization Technical
substrates of man-made materials should be obtained in the
Barriers to Trade (TBT) Committee.
same manner. The test surface should be in good physical
condition, not badly cracked, scratched, or otherwise damaged
2. Terminology
so as to interfere with evaluation of polish properties. Various
2.1 shoe polish—aids in cleaning, improving the
colors are required, see Section 9.
appearance, and protecting leather or other shoe materials from
4.4 Applicators—Several methods of shoe polish applica-
such common damaging effects as scuffs, water, salt water, and
tion to substrates should be tested. Various types of applicators
other surface deposits, commonly encountered with the use of
include brush, cloth, and foam. The same type of applicator
shoes outdoors or indoors. A buffable shoe polish requires
buffing to obtain appearance improvements. should be used to apply the polish for both the control and test
polish.
3. Significance and Use
4.5 Polishing Cloth—The same type of polishing cloth
3.1 This practice is intended to define the properties to be
should be used for each sample. Materials such as washed
tested, the apparatus to use, and the comparisons of product
cheese cloth, rumple cloth, flannel, cotton diaper cloth, and
performance. It is recognized that considerable discretion
nonwoven fabrics are suitable for this purpose. Felt or paper
exists among formulators and marketers of shoe polish on what
should not be used.
properties or performance characteristics are best for their
products. This practice will be flexible to honor this fact within 4.6 Polishing Brush—A separate horsehair brush or horse-
the confines of the shoe polish definition in 2.1. hair composition shoe brush should be used with each sample.
4.7 Cleaning Solvent—Aliphatic solvents with kauri-
4. Apparatus and Materials
butanol values less than 38.
4.1 Test Polish.
4.8 Eye Droppers and Tap Water.
4.2 Control Polish—The control polish is selected subjec-
tively for comparison to the test polish. It may be a competitive
4.9 Sharp Metal Knife.
4.10 Light-Colored Wool, Polyester/Cotton Pieces, of trou-
This practice is under the jurisdiction of ASTM Committee D21 on Polishes
ser or dress clothing.
and is the direct responsibility of Subcommittee D21.04 on Performance Tests.
Current edition approved Sept. 1, 2023. Published September 2023. Originally 4.11 Thermometer.
approved in 1981. Last previous edition approved in 2016 as D4002 – 81 (2016).
DOI: 10.1520/D4002-81R23. 4.12 Humidity Gauge.
Copyright © ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States
D4002 − 81 (2023)
5. Precautions 8.1.1 These four positionings should be written on tags and
drawn randomly by each of the four who apply the polishes.
5.1 The temperature and relative humidity of the test runs
should be measured and recorded. The temperature should be 8.2 Method B—A controlled, randomized method of laying
within 13 °C to 29 °C (55 °F to 85 °F) with a relative humidity out the test (X) and control (C) polishes is represented as
of 20 % to 80 %. follows:
Test Panel Left Right
5.2 The substrate should have the same temperature as the
1 C X
surrounding area.
2 X C
3 C X
5.3 Comparisons should not be made between two separate
4 X C
swatches (or leather objects) since leather substrates may vary
8.2.1 These four positionings should be written on tags and
widely.
drawn randomly by each of the four who apply the polishes.
5.4 Leather substrates are normally used only one time.
9. Evaluation
6. Personnel and Instructions
9.1 Compare the test polish and the control as follows:
6.1 The application and evaluation of the test and control 9.1.1 Application and Buffıng Properties (ease of rub-up to
polishes require four individuals. They should be capable of maximum gloss)—During application and buffing of the
making discriminating judgments of subjective physical and polishes, note the time and ease with which each product
aesthetic properties. Training and orientation to specific prod- develops maximum gloss.
uct performance characteristics may be required. 9.1.2 Final Properties—Evaluate any or all of the following
properties no sooner than 5 min following application:
6.1.1 The four persons should apply the polishes to one of
9.1.2.1 Gloss—Evaluate as depth of gloss and buffing.
each of the four test substrates. All persons then rate all
properties, except application properties, on the remaining 9.1.2.2 Uniformity—Observe the surface for streaks, unpol-
ished dry spots, and general uniformity.
three panels that they did not apply polish to. The persons
applying the polishes should rate ease of use and other 9.1.2.3 Film Clarity—Observe the clearness or sharpness of
an object’s image in the surface of the polish. Overhead lights,
application properties. This means there will be only four
readings on application properties. The three rating the other face, hand, or other objects may be used for reflection. This test
may be eliminated for low-lustre surfaces that do not possess
properties, do not observe the application because they rate
properties of each polish “blind.” mirror-like finishes.
9.1.2.4 Smear and Scuff Resistance—Smear is the degree of
oiliness or greasiness after the polish is rubbed-up to the
7. Procedure
desired polish appearance. Scuff is the degree of film damage
7.1 Cleaning of Test Substrates—An aliphatic solvent hav-
resulting from a glancing blow to the polish substrate. Check
ing a kauri-butanol value less than 38 should be used to lightly
smear by making a design such as an “S” with one’s finger. A
wipe the test substrate. Soft cotton towels may be used to apply
glancing blow with one’s knuckles or soft object such as a
the solvent to the surface and to wipe it clean. New or
book or magazine may be used for determining the degree of
adequately laundered towels should be used each time.
scuff.
7.2 Surface Subdivision—The precleaned surface of each
9.1.2.5 Film Healing—Observe the length of time required
test substrate should be divided and outlined by tape with
for the smear or scuff in 9.1.2.4 to disappear from the polish
uniform squares.
film, should it occur.
9.1.2.6 Rebuffability—Observe the ease of completeness or
7.3 Application of polish or wax—Assuming the control
repairability when the smears and scuffs are buffed with a
polish or the test polish is a commercially available product,
polishing cloth. The amount of physical effort and length of
follow the directions on the container as far as possible. When
time required is noted.
in doubt on the method of use, the
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