Standard Specification for Chromium Sputtering Targets for Thin Film Applications

SCOPE
1.1 This specification covers sputtering targets fabricated from chromium metal.
1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.
1.3 The values stated in SI units are regarded as standard.

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Historical
Publication Date
09-Aug-1998
Technical Committee
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ASTM F1367-98 - Standard Specification for Chromium Sputtering Targets for Thin Film Applications
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NOTICE: This standard has either been superseded and replaced by a new version or withdrawn. Contact
ASTM International (www.astm.org) for the latest information.
Designation: F 1367 – 98
AMERICAN SOCIETY FOR TESTING AND MATERIALS
100 Barr Harbor Dr., West Conshohocken, PA 19428
Reprinted from the Annual Book of ASTM Standards. Copyright ASTM
Standard Specification for
1
Chromium Sputtering Targets for Thin Film Applications
This standard is issued under the fixed designation F 1367; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
A
TABLE 1 Chromium Grades
1. Scope
Metallic Impurity Level by
1.1 This specification covers sputtering targets fabricated
Grade Implied Purity, %
Weight, ppm, max
from chromium metal.
4N 99.99 100
1.2 This specification sets purity grade levels, physical
3N7 99.97 300
attributes, analytical methods and packaging requirements.
3N5 99.95 500
3N 99.9 1000
1.3 The values stated in SI units are regarded as standard.
2N8 99.8 2000
A
2. Referenced Documents Additional grades may be designated by following the same pattern. That is,
examine the purity expressed in weight percent. Count the leading, “9’s” and set
2.1 ASTM Standards:
this number as “n”. Then note the first following digit, if present, (rounded if
2
E 112 Test Methods for Determining Average Grain Size necessary) and call this numeral “x”. The grade is expressed as “nNx”.
3. Terminology
upon between the purchaser and the supplier, but these shall
not be counted in determining the grade designation.
3.1 Definitions of Terms Specific to This Standard:
3.1.1 raw material lot—original material lot from which a 6.3.1 Acceptable limits and analytical techniques for addi-
tional elements shall be agreed upon between the purchaser and
number of targets is fabricated.
3.1.2 relative density, n—actual target density divided by the supplier.
2
the theoretical density of chromium, 7.21 g/cm .
7. Physical Properties
4. Classification
7.1 Minimum relative density shall be agreed upon by the
purchaser and the supplier.
4.1 Grades of chromium are defined in Table 1.
4.2 Grade, as defined in Table 1, is based on the total 7.2 Actual target density shall be determined by Archimedes
principle or other acceptable techniques.
metallic impurity content of the metallic elements listed in
7.3 Grain size shall be agreed upon between the purchaser
Table 2. Elements not detected shall be counted and reported as
and the supplier, and reported in accordance with Test Method
present at the detection limit.
E 112.
5. Ordering Information
8. Dimensions, Mass, and Permissible Variations
5.1 Orders for these targets shall include the following:
8.1 Each target shall conform to an appropriate engineering
5.1.1 Grade,
drawing.
5.1.2 Configuration, (see 8.1 and 8.2),
8.2 Nominal dimensions, tolerances and other attributes
5.1.3 Whether certification is required, (see 12.1), and
5.1.4 Whether a sample representative of the finished prod- shall be agreed upon between purchaser and supplier.
uct is required to be provided by the supplier to the purchaser.
9. Workmanship, Finish and Appearance
6. Chemical Composition
9.1 Workmanship, finish and appearance shall be agreed
upon between the purchaser and the supplier.
6.1 The metallic elements listed in Table 2 shall be assayed
and reported.
10. Sampling
6.2 Gaseous elements to be assayed and reported are C, O,
10.1 Analyses for impurities shall be performed on a sample
N and S.
that is representative of the finished product.
6.3 Other elements may be assayed and reported as agreed
10.2 Reporting analytical results of the unprocessed raw
material lot is not acceptable.
1
This specification is under the jurisdiction of ASTM Committee F-1 on
11. Analytical Methods
Electronics and is the direct responsibility of Subcommittee F01.17 on Sputter
Metallization.
11.1 Analysis for impurities in Table 2 and 6.2 shall be
Current edition approved Aug. 10, 1998. Published October 1998. Originally
performed as follows:
published as F 1367-92. Last previous edition F 1367-92.
2
Annual Book of ASTM Standards, Vol 03.01. 11.1.1 Carbon, Oxygen and Sulfur—Combustion/infrared
1

---------------------- Page: 1 ----------------------
NOTICE:¬This¬standard¬has¬either¬been¬superceded¬and¬replaced¬by¬a¬new¬version¬or¬discontinued.¬
Contact¬ASTM¬International¬(www.astm.org)¬for¬the¬latest¬information.¬
F 1367
TABLE 2 Minimum Metallic Elements To Be Assayed
Metallic Elements To Be Assayed For
Aluminum, nickel, silicon, titanium, vanadium
spectrometry, mdl of 10 ppm, or less. detection limit for each element listed in Table 2 that was not
11.1.2 Nitrogen—Thermal conductivity spectrometry, mdl detected in the analysis shall be noted on the certificate of
of 10 ppm, or less.
analysis.
11.1.3 All Others—AA, d
...

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