CLC/BTWG 83-1 - On-line monitoring of metallic contamination in silicon wafers
To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques.
On-line monitoring of metallic contamination in silicon wafers
To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques.
General Information
Frequently Asked Questions
CLC/BTWG 83-1 is a Technical Committee within CLC. It is named "On-line monitoring of metallic contamination in silicon wafers" and is responsible for: To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques. This committee has published 0 standards.
CLC/BTWG 83-1 develops CLC standards in the area of V17 - ELECTRONIC MEASURING EQUIPMENT - Information technology. The scope of work includes: To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques. Currently, there are 0 published standards from this technical committee.
CLC is a standardization organization that develops and publishes standards to support industry, commerce, and regulatory requirements.
A Technical Committee (TC) in CLC is a group of experts responsible for developing international standards in a specific technical area. TCs are composed of national member body delegates and work through consensus to create standards that meet global industry needs. Each TC may have subcommittees (SCs) and working groups (WGs) for specialized topics.